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Aryl sulfonium salt, polymerizable composition and polymerization method of the same

A technology of aryl sulfonium salt and polymerization method, which is applied in the field of aryl sulfonium salt, can solve the problems of not mentioning, not being able to absorb ultraviolet light, not being able to produce colorless products, etc.

Inactive Publication Date: 2005-08-10
CHITEC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Although there are some low molecular weight aryl sulfonium salts, such as three 4-methylphenyl sulfonium salts (tris(4-methylphenyl)sulfonium salts) and three 4-chlorophenyl sulfonium salts (tris(4-chlorophenyl)sulfonium salt), in No benzene-containing residues will be produced during the irradiation process, but it has the disadvantages of not being able to absorb longer wavelength ultraviolet light and not producing colorless products
There are also some patents proposing special synthetic methods of aryl sulfonium salts, such as the technology of a synthetic aryl sulfonium salt disclosed in US Patent No. 2807648 in 1957, but there is no mention that it will not produce Arylsulfonium salts of benzene-free

Method used

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  • Aryl sulfonium salt, polymerizable composition and polymerization method of the same
  • Aryl sulfonium salt, polymerizable composition and polymerization method of the same
  • Aryl sulfonium salt, polymerizable composition and polymerization method of the same

Examples

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Embodiment 1

[0033] Take 210g (1.6mole) of aluminum chloride and add it to a three-necked round bottom flask containing 580g of toluene. The solution was stirred and cooled to about 10°C. Next, slowly add 100 g (0.74 mole) of sulfur monochloride (sulfur monochloride) into the solution, and keep the solution temperature between 13°C and 18°C. After about 1 hour of reaction, about 200 g of chlorine gas was slowly introduced to keep the solution temperature between 13°C and 18°C. This solution was poured into a beaker containing 600 g of ice cubes and stirred until the entire solid was dissolved. After standing still for 30 minutes, the lower layer was separated, and was successively washed with sulfuric acid solution (containing 50g H in 600g water) 2 SO 4 ) and sodium hydroxide solution (20g NaOH in 100g water) to extract the lower layer. Then, the lower layer product obtained by the extraction was poured into another beaker containing 600 ml of water to form a mixture. After that, joi...

Embodiment 2

[0035] Take 121g (0.89mole) of aluminum chloride (Aluminum chloride) and add it to a three-necked round bottom flask containing 298g of n-butylbenzene. The solution was stirred and cooled to about 10°C. Next, slowly add 50 g (0.37 mole) of sulfur monochloride into the solution, and keep the solution temperature between 13°C and 18°C. After approximately 1 hour of reaction, approximately 46 g of chlorine gas was introduced slowly, and the temperature of the solution was kept between 13°C and 18°C. This solution was poured into a beaker containing 300 g of ice cubes and stirred until the entire solid was dissolved. Then stand for 30 minutes to separate the lower layer, and successively with sulfuric acid solution (containing 25g H in 300g water) 2 SO 4 ) and sodium hydroxide solution (containing 10gNaOH in 50g of water) to extract the lower layer. Then, the lower layer product obtained by the extraction was poured into another beaker containing 300 ml of water to form a mixt...

Embodiment 3

[0037] Take 121g (0.89mole) of aluminum chloride (Aluminum chloride) and add it to a three-neck round bottom flask containing 500g of 1,2,3,4-tetrahydronaphthalene (1,2,3,4-tetrahydronaphthalene). The solution was stirred and cooled to about 15°C. Next, slowly add 50 g (0.37 mole) of sulfur monochloride into the solution, and keep the solution temperature between 20°C and 25°C. After about 1.5 hours of reaction, about 60 g of chlorine gas was slowly introduced to keep the solution temperature between 20°C and 25°C. This solution was poured into a beaker containing 300 g of ice cubes and stirred until the entire solid was dissolved. Then let it stand for 30 minutes to separate the lower layer, and successively wash it with sulfuric acid solution (containing 30gH in 360g water) 2 SO 4 ) and sodium hydroxide solution (containing 10g NaOH in 50g water) to extract the lower layer. Then, the lower layer product obtained by the extraction was poured into another beaker containing...

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Abstract

The invention discloses an aryl sulfonium salt, which is shown as the chemical formula (I): Z represents one hydrogen atom or the chemical formula (II), wherein, the substitutional group from R1 to R12 are respectively independent hydrogen atoms, alkyls from C1 to C12 or naphthenic bases from C3 to C12; each phenyl has at least one alkyl or naphthenic base respectively and independently; furthermore, X<-> and Y<-> are respectively independent anions. The aryl sulfonium salt has the advantages of not producing benzene after photoinduction. The invention also discloses a polymeric composition containing the aryl sulfonium salts and the polymerization method.

Description

technical field [0001] The invention relates to an aryl sulfonium salt, a photopolymerizable composition containing the aryl sulfonium salt, and a polymerization method thereof. Background technique [0002] The industry has used aryl sulfonium salts for many years, such as in coatings, adhesives, inks, photoresists and 3D stereolithography. Because of their highly photo-active properties, arylsulfonium salts can be used as a strong acid source for photochemical reactions to induce polymerization of monomers, oligomers, or related polymers. Therefore, whether it is used as a photoinitiator in the photopolymerization industry or as a photoacid generator in lithography technology, it can prove the success of commercial application of arylsulfonium salts. [0003] However, in recent years, arylsulfonium salts have been detected as by-products of suspected carcinogen benzene in the application of photohardening process, so their use has been restricted. Since arylsulfonium sal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C381/12C08F2/50C08G59/68G03F7/00G03F7/004G03F7/029
CPCC08G59/687G03F7/0045C07C381/12G03F7/029G03F7/0037
Inventor 曲清蕃杨郡慈
Owner CHITEC TECH