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Position measurement method, exposure method, exposure device, and manufacturing method of device

A technology of measurement method and exposure method, which is applied in the direction of measurement device, semiconductor/solid-state device manufacturing, optical device, etc., to achieve the effect of improving exposure accuracy and long-term stable position measurement

Inactive Publication Date: 2005-08-17
NIKON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, there is a possibility that a measurement error may occur due to the influence of noise contained in the imaging signal

Method used

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  • Position measurement method, exposure method, exposure device, and manufacturing method of device
  • Position measurement method, exposure method, exposure device, and manufacturing method of device
  • Position measurement method, exposure method, exposure device, and manufacturing method of device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0095] Figure 9 Waveform data obtained by performing the signal processing represented by the above formula (1) is shown.

[0096] D=(Dm-Dnb) / (Dna-Dnb)...(1)

[0097] That is, in this example, as an algorithm for noise correction, the signal waveform data (Dnb) obtained by subtracting the light quantity-independent component of noise from the signal waveform data (Dm) of the mark is processed by using the light quantity-dependent component of noise The processing result of subtracting the signal waveform data (Dnb) of the light intensity-independent component from the signal waveform data (Dna) is subjected to division processing. As a result, the influence of noise on the marked imaging signal is well corrected.

Embodiment 2

[0099] Figure 10 Waveform data subjected to signal processing represented by the following formula (2) is shown.

[0100] D=(Dm-Dnb)...(2)

[0101] That is, in this example, as an algorithm for noise correction, a process of subtracting the light amount-independent component of noise from the signal waveform data (Dm) of the marker is performed. As a result, the influence of noise (light intensity-independent components) on the marked imaging signal can be corrected satisfactorily. This example can be suitably applied to a case where there are many light quantity-independent components included in noise and few light quantity-dependent components. In this example, compared with the processing algorithm shown in the above-mentioned formula (1), it can be performed by simple arithmetic processing, so that a high yield can be obtained.

Embodiment 3

[0103] Figure 11 Waveform data subjected to the signal processing represented by the above-mentioned expression (3) is shown.

[0104] D = (Dm-Dna) ... (3)

[0105] That is, in this example, as an algorithm for noise correction, a process of subtracting the light-amount-dependent component of noise from the signal waveform data (Dm) of the marker is performed. As a result, the influence of noise (light intensity-independent components) on the marked imaging signal can be corrected satisfactorily. This example is suitable for the occasion where there are many light-quantity-dependent components included in the noise and few light-quantity-independent components. In this example, compared with the processing algorithm shown in the above-mentioned formula (1), it can be completed by simple arithmetic processing, so a high throughput can be obtained.

[0106] In this way, in any of the embodiments, the influence of noise on the marked imaging signal can be well corrected. The...

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Abstract

With this position measurement method, a mark which has been formed upon an object is illuminated with an illumination beam, a beam which is generated from this mark is picked up via an observation system, and the resultant image signal is signal processed so as to measure positional information which is related to the mark. This signal processing is performed based upon information related to the noise which is included in the component dependent upon the amount of light which is included in the image signal, and upon said image signal. As a result, it is possible to measure the positional information for the mark with good accuracy, even if noise is included in the image signal.A position measurement method includes a step of illuminating a mark formed on an object by an illumination beam, a step of imaging a beam generated from the mark via an observation system, and a step of processing the imaging signal so as to measure the position information associated with the mark position. The signal processing is performed according to information on a noise containing a light-quantity-dependent component contained in the imaging signal and the imaging signal. As a result, it is possible to accurately measure the mark position information even when the imaging signal contains a noise.

Description

technical field [0001] The present invention relates to a position measurement method. The position measurement method takes an image of a mark formed on an object through an observation system, performs signal processing on the imaged signal, and obtains position information related to the position of the mark; Exposure methods and exposure equipment used in the manufacturing process of devices such as liquid crystal display elements. Background technique [0002] In the manufacturing process of devices such as semiconductor elements and liquid crystal display elements, multilayer circuit patterns are superimposed on a substrate (wafer, glass plate, etc.) in a predetermined positional relationship while performing programming. For this reason, when exposing the second layer and subsequent circuit patterns on the substrate with an exposure device, it is necessary to align the pattern of the mask (or reticle) with the pattern already formed on the substrate with high precisio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00
CPCG03F9/7092G03F9/7076G03F1/38
Inventor 小林满
Owner NIKON CORP
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