Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optical recording medium master exposure device and optical recording medium master exposure method

A technology of optical recording medium and exposure device, which is applied in the direction of optical recording head, optical recording carrier, light beam guiding device, etc., and can solve the problem that photoresist has not been put into practical application, etc.

Inactive Publication Date: 2005-10-19
SONY CORP
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0016] However, at present, in this technique of forming a recording information modulation signal for an optical recording medium on a photoresist by patterned exposure using a two-photon absorption process, the light used to expose the optical recording medium master Resist has not yet been put into practical application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical recording medium master exposure device and optical recording medium master exposure method
  • Optical recording medium master exposure device and optical recording medium master exposure method
  • Optical recording medium master exposure device and optical recording medium master exposure method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0063] An optical disc master exposure apparatus according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0064] FIG. 1 is a schematic structural view of an optical recording medium master disk exposure device according to an embodiment of the present invention. In this embodiment, the exposure device is composed of a modulating component 3 and a focusing optical system 9, wherein the modulating component modulates the light intensity emitted by the exposure light source 1 according to the recording information, and the focusing optical system focuses the light modulated by the modulating component 3 on the disk-shaped light On the photoresist 12 on the recording medium master disc 11 , the photoresist 12 is patterned and exposed according to the recorded information.

[0065]As shown in Figure 1, the pulsed laser light emitted by the exposure light source 1 is reflected by the mirror 1a through the high-order h...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
wavelengthaaaaaaaaaa
wavelengthaaaaaaaaaa
Login to View More

Abstract

An optical recording medium master exposure device includes: modulation means (3) for light-intensity-modulating light from an exposure light source (1) according to the recording information; and a collection optical system (9) for collecting the light modulated by the modulation means (3) onto a photo-resist (12) on an optical recording medium master (11). The photo-resist (12) is subjected to pattern exposure according to the recording information. The exposure light source (1) emits an ultra-short pulse laser of repetitive frequency which is a recording information clock frequency multiplied by an integer of 1 to 20. This ultra-short pulse laser oscillator length can be modified. The repetitive frequency of the ultra-short pulse laser is mode-locked in synchronization with the clock frequency. An external synchronization mechanism is provided for pulse oscillation. Thus, it is possible to form a very small pit with a high accuracy.

Description

technical field [0001] The present invention relates to an optical recording medium master exposure device and an optical recording medium master exposure method, wherein an optical recording medium master coated with a photoresist is exposed by irradiating light from an exposure light source into an optical recording medium master. Graphics corresponding to recorded information. Background technique [0002] Optical recording medium masters for manufacturing optical recording media such as various optical disks and magneto-optical disks such as CD (Compact Disc), MD (Mini Disc), and DVD (Digital Versatile Disc) can be manufactured by exposing and developing, that is, for example Manufactured by cutting out a concavo-convex pattern corresponding to the recording information formed on the photoresist surface of the disc-shaped master substrate. [0003] The main device (mastering apparatus) that is used to cut concave-convex pattern is optical recording medium master disk ex...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G11B7/125G11B7/126G11B7/1378G11B7/1398G11B7/26
CPCG11B7/126G11B7/261G11B7/1398G11B7/1378B82Y10/00G11B7/128G11B7/26
Inventor 玉田作哉
Owner SONY CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com