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Large-scale apparatus for synthesis of trichlorosilane and synthesis method thereof

A synthesis device, trichlorosilane technology, applied in the direction of silicon halide compounds, halosilane, etc., can solve the problems of low raw material utilization rate or conversion rate, low trichlorosilane content, small synthesis capacity, etc., to increase gas Fixed contact time, high product quality, stable reaction effect

Active Publication Date: 2005-11-23
CHINA ENFI ENG CO LTD
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  • Summary
  • Abstract
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  • Claims
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AI Technical Summary

Problems solved by technology

[0009] The purpose of the present invention is to provide a large-scale trichlorosilane synthesis device and synthesis method, solve the problem of large-scale production of trichlorosilane, and solve the problems of small synthesis capacity, unstable reaction, raw material utilization rate or Problems such as low conversion rate and low content of trichlorosilane in the product

Method used

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  • Large-scale apparatus for synthesis of trichlorosilane and synthesis method thereof

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Embodiment Construction

[0029] Examples see figure 1 , the large-scale trichlorosilane synthesis device of the present invention has a cylindrical structure, and the enlarged part of the upper cylinder body is a gas-solid separation section 1, and the neck of the gas-solid separation section 1 is rounded and truncated, and this section is provided with a discharge port 8, The opening of discharge port 8 is inclined downward, which is beneficial to discharging.

[0030] The straight barrel section in the middle is the reaction section 2, the reaction section is covered with a heater 3, and a silicon powder feed port 9 is arranged above the heater, and the opening of the silicon powder feed port 9 is inclined upward, which is beneficial for feeding.

[0031] The bottom is connected to the lower head 7, and the lower head is provided with a hydrogen chloride inlet 10 and a slag discharge port 13, and a pressure measuring port 14 can also be provided when necessary.

[0032] A gas distribution plate 11 ...

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Abstract

The invention discloses a large-scale apparatus for synthesis of trichlorosilane in the form of tubular arrangement, the upper barrel diameter enlargement portion is a gas-solid separation section equipped with a discharge port, the intermediate section is a straight cartridge of reaction segment with an enveloping heating apparatus, the heating apparatus is provided with a silicon powder charging aperture on the upper portion, the bottom is connected with a lower sealing head, which is provided with a hydrogen chloride inlet port and a slag exit. A gas distributing plate is arranged above the hydrogen chloride inlet port on the bottom of the barrel reaction segment.

Description

(1) Technical field [0001] The invention relates to a synthetic device and a synthetic method of chemical products, in particular to a trichlorosilane synthetic device and a synthetic method. (2) Background technology [0002] At present, the production of trichlorosilane mainly adopts a small-diameter trichlorosilane synthesis device (less than 400mm in diameter). Silicon powder is intermittently added to the trichlorosilane synthesis device, hydrogen chloride enters the trichlorosilane synthesis furnace after metering, and silicon powder and hydrogen chloride react in the reaction zone in the furnace to produce trichlorosilane and silicon tetrachloride, as well as a small amount of dichlorosilane Chlorosilane. The produced chlorosilanes (trichlorosilane, silicon tetrachloride, a small amount of dichlorodihydrosilane and other silicon high boiling compounds) undergo gas-solid separation, and then enter the chlorosilane cooling and condensation system. During the reaction ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/08
Inventor 沈祖祥严大洲汤传斌肖荣晖
Owner CHINA ENFI ENG CO LTD
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