Image interference photoetching method using end acousto-optical deflector and its system

Abstract

The present invention relates to an imaging interference photoetching method by adopting one acousto-optic deflector and its system. It is characterized by that said invention only uses one acousto-optic deflector to make laser beam sent out by laser produce deflection, and utilizes the control of exposure intensity and exposure dose and utilizes the change of ultrasonic frequency to real-time control deflection angle size so as to implement triple exposure required for imaging interference photoetching process and raise exposure efficiency and resist pattern quality.

Description

technical field [0001] The invention relates to an imaging interference lithography method and system using an acousto-optic deflector, which belongs to the improvement of the imaging interference lithography technology. Background technique [0002] Imaging interference lithography is a new lithography technology that uses multiple exposures with different spatial frequency components to incoherently superimpose to improve the resolution of lithography. The general imaging interference lithography method is to use lasers, beam splitters, mirrors, spatial filters, beam expander collimators, masks, imaging optical systems and resist substrates to form imaging interference lithography systems, literature Xiaolan Chen and S.R.J.Brueck, Imaging interferometric lithography for arbitrary patterns, SPIE Proceedings Vol.3331, 214-224, 1997 and literature S.R.J.Brucek, Imaging interferometric lithography, Microlithography World, Winter 1998, 2-10 introduced the principles and techniq...

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Problems solved by technology

The general imaging interference lithography method is to use lasers, beam splitters, mirrors, spatial filters, beam expander collimators, masks, imaging optical systems and resist substrates to form imaging interference lithography systems, literature Xiaolan Chen and S.R.J.Brueck, Imaging interferometric lithography for arbitrary patterns, SPIE Proceedings Vol.3331, 214-224, 1997 and literature S.R.J.Brucek, Imaging interferometric lithography, Microlithography World, Winter 1998, 2-10 introduced the principles and techniques of imaging interference lithography, However, there are too few researches on the specific implementation, system optimization and practicality. Generally, adjusting the optical path between exposures to achieve three exposures, image alignment, etc. are key issues that need to be solved, and the exposure efficiency is not high, which is not conducive to popularization and application.

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