The invention belongs to the technical field of optical instruments and meters, and provides a phase measuring device for a laser interference photoetching system and a using method thereof. The phasemeasuring device comprises a first wave plate, a first polarization splitting prism, a fourth wave plate, a backward reflecting mirror, a third wave plate, a reflecting mirror, a second wave plate, apolarizing film, a second polarization splitting prism, a third polarization splitting prism, a first photoelectric detector, a second photoelectric detector and a base, wherein the first polarization splitting prism, the second polarization splitting prism, the third polarization splitting prism, the first photoelectric detector and the second photoelectric detector are fixed on the base; the first wave plate, the second wave plate, the third wave plate and the fourth wave plate are respectively arranged around the first polarization splitting prism; the polarizing film and the emergent surface of the third polarization splitting prism, the backward reflecting mirror outside the fourth wave plate, and the reflecting mirror outside the third wave plate form a light path system for phase measurement. An interference measurement signal is resolved to obtain a measurement light phase, and the device and the method are used for fringe control of variable-period interference exposure.