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143 results about "Laser coating" patented technology

UV (Ultraviolet)-compound laser coating composition

The invention discloses a UV (Ultraviolet)-compound laser coating composition which is a 100% UV containing coating. The composition comprises the following components in parts by weight: 10-60 parts of a light-cured resin, 35-75 parts of a photopolymerization monomer, 2-8 parts of a photoinitiator and 0-3 parts of an assistant. According to the UV-compound laser coating composition disclosed by the invention, a holographic laser effect is obtained by using mould pressing and a UV illuminating and curing process. As the mould pressing and the UV illuminating and curing process are adopted at the same time, the UV-compound laser coating composition not only can be used for obtaining the laser effect of a common shallow groove, but also can be used for making a laser pattern of a deeper groove. Compared with the prior art, the composition disclosed by the invention further has the advantages that by adopting the 100% UV containing formula which contains fewer solvents or no solvents, during use, less solvents volatilize, so that air pollution is reduced; by adopting UV curing, the energy resources are saved and the speed is fast, and the production efficiency is improved; the temperature is low during UV curing, and the influence on the base material in temperature distortion is reduced.
Owner:SHANGHAI CHENGYING NEW MATERIALS +1

Continuous rapid laser coating method of superconducting layer in second-generation high-temperature superconducting strip

The invention provides a continuous rapid laser coating method of a superconducting layer in a second-generation high-temperature superconducting strip. According to the invention, through a method of bi-dimensionally scanning a superconducting target along an x-y axle, the whole surface of the target can be utilized and a laser evaporation coating process can be stably and sustainably carried out; coating intervals are increased through a method of scanning along the motion direction of the strip by use of laser spots; and the width of the coating interval vertical to the motion direction of the strip is increased through a method of twining the strip on a belt roller above a heater multiple times. By using the method provided by the invention, evaporated substances are fully collected on a metal base band to the greatest extend, thereby effectively improving the preparation speed of the strip, increasing the utilization rates of the target and the evaporated substances, greatly improving the production efficiency and reducing the production cost of the strip. According to the method provided by the invention, the rapid coating of the second-generation high-temperature superconducting strip suitable for large-scale industrial production can be realized.
Owner:SHANGHAI SUPERCONDUCTOR TECH CO LTD

Multichannel pulsed laser deposition method for preparing YSZ buffer layer

ActiveCN102251219AOvercome the disadvantage of small coating areaPurely unidirectionalVacuum evaporation coatingSputtering coatingDeposition temperatureLaser coating
The invention discloses a multichannel pulsed laser deposition method for preparing a YSZ buffer layer, which comprises the following steps of: arranging a nickel-tungsten metal base band, a Hastelloy band, a stainless steel band or other metal base bands in a deposition cavity, winding on a band roller of a metal band transmission device of multichannel pulsed laser deposition equipment for multiple times, and raising the temperature of a heater to deposition temperature; opening an oxygen channel; starting a YSZ target manipulator and beginning the x-direction and y-direction scanning and rotation of a YSZ laser evaporation target platform; opening an optical path window of a laser, and beginning pre-evaporating the YSZ target platform; beginning depositing; and making the metal base band pass through the heater for multiple times due to multiple winding of a roll shaft of the transmission device, and finally stopping corresponding equipment. The YSZ buffer layer is prepared by the multichannel pulsed laser deposition method, so that a defect of a small deposition area of a unichannel pulsed laser deposition method is overcome, the deposition speed is greatly improved, various advantages of the pulsed laser deposition method are exerted fully, and the prepared YSZ buffer layer has single orientation, high surface quality and high crystallinity.
Owner:SHANGHAI SUPERCONDUCTOR TECH CO LTD

Simplified baffle layer suitable for IBAD-MgO (ion beam assisted deposition-magnesium oxide) growth on metal substrate and preparation method thereof

The invention discloses a simplified baffle layer suitable for IBAD-MgO (ion beam assisted deposition-magnesium oxide) growth on a metal substrate and a preparation method thereof. The simplified baffle layer is arranged on the metal substrate and is a single YAlO baffle layer; and the single YAlO baffle layer is prepared by adopting a multi-channel pulse laser coating technology or a multi-channel magnetron sputtering technology. The YAlO baffle layer with a smooth surface, even surface particle size, low roughness and strong bonding strength is prepared; the YAlO baffle layer can prevent atoms of the metal substrate from diffusing to the other layers, can reduce the roughness of the metal substrate and also can be used as a nucleation layer of an IBAD-MgO layer; the surface roughness of the YAlO baffle layer is smaller than 2 nanometers; the texture degree in the surface of the prepared IBAD-MgO layer is less than 7 degrees; and a rare earth oxide superconducting layer with high performance can epitaxially grow on the baffle layer. By adopting the simplified baffle layer, the quantity of the baffle layers for IBAD-MgO is reduced; simplification, fast speed and low cost of the manufacturing technology are achieved; the simplified baffle layer has high stability, repeatability and reliability, and good application prospect in industry, and is suitable for industrial production.
Owner:SHANGHAI SUPERCONDUCTOR TECH CO LTD

Laser coating device and method based on transparent material

The invention discloses a laser coating device and a method based on a transparent material, belonging to the field of micro-machining. The device comprises a computer, a laser which is connected with the computer, a laser control system which is installed on the laser, a workstation, a transparent material plate, a target and a flat plate, wherein the laser is connected with the computer, the workstation is arranged below the laser control system, and the transparent material, the target and the flat plate are arranged on the workstation from top to bottom in sequence. When in coating, the target is arranged at the lower surface of the transparent material plate, the laser penetrates the transparent material from the upper surface and then illuminates on the target, and then the target is heated, melted and sputtered onto a close transparent substrate, later high calorie leads the transparent substrate to generate micro-melting, and thus causing a coating layer to be formed on the transparent material. The device has the advantages of simpleness, low cost, high precision and good controllability, and can coat a film with micron-level or nano-level thickness on the surface of the transparent material, wherein the film has good edge sharpness and the shape of the film can be controlled by the computer output.
Owner:BEIJING UNIV OF TECH

Waterborne polyurethane emulsion for composite laser coating

The invention discloses waterborne polyurethane emulsion for a composite laser coating. The waterborne polyurethane emulsion is prepared by the following steps: performing vacuum dehydration on macromolecular polyhydric alcohol at the temperature of 120-130 DEG C for 1-1.5 hours, reducing the temperature to be 50-60 DEG C, adding diisocyanate and epoxy resin, raising the temperature to be 75-85 DEG C, and reacting for 2.5-3 hours; adding a hydrophilic chain extender and reacting for 1-2 hours; adding an alcohol chain extender and reacting for 2-3 hours, and adding acetone to reduce the viscosity during the period; adding a neutralizer, and carrying out a neutralization reaction at the temperature of 40-50 DEG C for 0.5-1 hour to obtain a neutralization product; adding the neutralization product into water in which an amine chain extender is dissolved, carrying out shearing emulsification at 30-40 DEG C for 0.5-2 hours while controlling the stirring speed to be 2000-4000rpm to obtain primary emulsion, and evaporating to remove acetone under reduced pressure to obtain the emulsion. The emulsion is a self-emulsified system and does not contain small molecular emulsifier, and an emulsifier migration phenomenon is avoided; the waterborne polyurethane emulsion is high in adhesive force with a base material, and interlayer separation is avoided; moreover, the waterborne polyurethane emulsion has high solvent resistance and paint film printability.
Owner:SHANGHAI CHENGYING NEW MATERIALS
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