The invention discloses an aluminum-
scandium alloy sputtering target material and a preparation method thereof, and belongs to the technical field of high-performance aluminum-
scandium alloy target materials. In the aluminum-
scandium alloy target material, the content of scandium is 5 at%-50 at%, and the balance is aluminum. The preparation method comprises the following steps of 1, preparing materials; 2,
smelting and
casting ingots; 3, calcining or rolling; 4, sampling and detecting; 5, milling and cleaning; 6, carrying out
vacuum packing. According to the present invention, the aluminum-scandium alloy target material is prepared through a vacuum induction
levitation melting furnace and a
rapid casting and rapid condensation technology, and the thickness of the prepared aluminum-scandiumalloy target material is 2-35 mm, the density is 99.9%, the scandium content is 5-50 at%, and the balance is the
aluminum element. The preparation method is easy to operate, the alloy is uniform, theutilization rate of the expensive
metal scandium is high, and the industrial application is facilitated. The characteristics of good component uniformity and good subsequent
machinability satisfy therequirements of the semiconductors and the
sputtering target materials in the special fields, and the defects in the prior art are overcome.