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Photosensitive resin composition, photosensitive layer therefrom and photosensitive resin printing original plate

一种感光性树脂、组合物的技术，应用在感光性树脂印刷用原版,感光性树脂组合物领域，能够解决微小浮雕的图像再现性下降、分散相粒径变大、不均匀等问题，达到图像再现性良好的效果

Inactive Publication Date: 2006-05-10
TOYOBO MC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, in these methods, although the dispersed phase is micronized, since solid rubber is used in most of the continuous phase, there is agglomeration of fine particles in the phase structure formation stage, and as a result, the particle size of the dispersed phase becomes large. , or a tendency to become uneven
For this reason, there is a problem that the transmitted light is scattered, and the image reproducibility of the micro-relief is lowered.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0061] The hydrophobic polymer (α) of the component (A): Acrylonitrile-butadiene latex (Nipol SX1503 non-volatile content 42%, manufactured by Japan Soon Corporation) 10 parts by weight, hydrophobic polymer (β): butadiene Latex (Nipol LX111NF non-volatile content 55%, manufactured by Japan Sonen Co., Ltd.) 58 parts by weight, component (B) oligobutadiene acrylate (manufactured by ABU-2S Koeisha Chemical Co., Ltd.) 28 parts by weight, methyl 4 parts by weight of lauryl acrylate (manufactured by Kyoeisha Chemical Co., Ltd.), 4 parts by weight of dimethylol tricyclodecane diacrylate, 1 part by weight of photopolymerization initiator as component (C), as a polymerization inhibitor 0.1 parts by weight of hydroquinone monomethyl ether, 0.1 parts by weight of nonionic surfactant as other additives and 15 parts by weight of toluene were mixed in a container, and then kneaded at 105 with a pressure kneader, and then passed Toluene and water were removed under reduced pressure, thereby obta...

Embodiment 2

[0066] (A) Component hydrophobic polymer (α): Acrylonitrile-butadiene latex (Nipol SX1503 non-volatile content 42%, manufactured by Japan Sosen Co., Ltd.) 10 parts by weight, hydrophobic polymer (β): Butadiene latex (Nipol LX111NF non-volatile content 55%, manufactured by Japan Sosen Co., Ltd.) 62 parts by weight; (B) component oligobutadiene acrylate (manufactured by ABU-2S Kyoeisha Chemical Co., Ltd.) 30 parts by weight, lauryl methacrylate (L. Kyoeisha Chemical Co., Ltd.) 4 parts by weight, 4 parts by weight of dimethylol tricyclodecane diacrylate; (C) component photopolymerization initiator 1 part by weight; (D) component hydrophilic polymerization (PFT-3 non-volatile content 25% manufactured by Kyoeisha Chemical Co., Ltd.) 18 parts by weight; polymerization inhibitor hydroquinone monomethyl ether 0.1 parts by weight; other additives non-ionic surfactant 0.1 parts by weight, and 15 parts by weight The parts by weight are mixed together in a container, then kneaded at 105 with ...

Embodiment 3

[0071]As the component (A), 62 parts by weight of butadiene latex (Nipol LX111NF non-volatile content 55%, manufactured by Japan Soon Co., Ltd.), acrylonitrile-butadiene latex (Nipol SX1503 non-volatile content, 43% made by Japan Soon Co., Ltd.) 10 parts by weight; 30 parts by weight of oligobutadiene acrylate (manufactured by ABU-2S Kyoeisha Chemical Co., Ltd.) as component (B); 0.45 parts by weight of photopolymerization initiator as component (C); as (D ) Component of hydrophilic polymer (PFT-3 non-volatile content 25% Kyoeisha Chemical Co., Ltd. product) 18 parts by weight; (E) component as a viscosity modifier (Oron A-7050 Toagosei Co., Ltd. product) 1 Parts by weight; 4 parts by weight of lauryl methacrylate as a crosslinking agent, 4 parts by weight of dimethylol tricyclodecane diacrylate; 0.03 parts by weight of hydroquinone monomethyl ether as a polymerization inhibitor; as others 0.04 parts by weight of the carboxylic acid copolymer as an additive was mixed with 15 parts...

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Abstract

To obtain a photosensitive resin composition, a photosensitive layer, and a photosensitive resin printing original plate that can be developed with an aqueous developer without hindrance, have resistance to aqueous inks and co-solvent inks, and have good image reproducibility, The present invention relates to a photosensitive resin composition, which contains: (A) at least two or more hydrophobic polymers obtained from water-dispersed latex; (B) photopolymerizable compounds; (C) photopolymerization initiators, characterized in that , the two or more hydrophobic polymers exist in the form of fine particles, respectively.

Description

Technical field [0001] The present invention relates to a photosensitive resin composition and a photosensitive resin printing original plate using the composition, that is, to a printing photosensitive resin composition and a printing original plate that can be developed with an aqueous developer and have excellent image reproducibility. Background technique [0002] There have been many reports about the use of chlorinated rubber, styrene-butadiene block copolymer, polyurethane and other elastomers as a single resin component, in which the photosensitive compound is formed by blending ethylenically unsaturated compounds and photopolymerization initiators. The resin composition exerts the characteristics of an elastomer and can be used as a flexographic printing plate. [0003] Among them, a document (see, for example, Japanese Patent Laid-Open No. 03-136052) proposes the following phase structure, which can be developed on a flexographic printing plate that can be developed wit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/033G03F7/00G03F7/004
CPCG03F7/033Y10S430/106Y10S430/108Y10S430/111
Inventor 和田通平松知纪富田晃
Owner TOYOBO MC CORP
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