Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Multi-layer nanometer film coater for reinforcing mould surface

A coating device, nano-multi-layer technology, applied in the direction of coating, sputtering plating, ion implantation plating, etc., can solve problems not related to the structure of the preparation device

Inactive Publication Date: 2006-05-31
北京东方新材科技有限公司
View PDF9 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Patents CN1470671A and CN200410053490.8 involve the preparation process of two superhard nano-multilayer films, but do not involve any structure of the preparation device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Multi-layer nanometer film coater for reinforcing mould surface
  • Multi-layer nanometer film coater for reinforcing mould surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] like figure 1 As shown, a vacuum chamber door 17 , an ion source 9 , a first evaporation device 4 and a second evaporation device 14 are installed on the vacuum chamber wall 16 . Each evaporation device is equipped with an independent gas supply system. A cylindrical partition support frame 3 and a plurality of partitions 7 are installed in the vacuum chamber, and the cylindrical partition support frame 3 and the partitions 7 divide the vacuum chamber into four isolation chambers 10 . There are four openings 6 on the cylindrical partition support frame 3 . A central air extraction pipe 2 is arranged in the cylindrical partition support frame 3 , and there are two first openings 15 and two second openings 11 on the central air extraction pipe 2 . The first openings 15 correspond to the evaporation device, the second openings 11 intersect between the first openings 15 , and the area of ​​the second openings 11 is larger than that of the first openings 15 . Workpiece ra...

Embodiment 2

[0025] like figure 2 As shown, two vacuum chamber doors 28 , two ion sources 22 , a first evaporating device 19 , a second evaporating device 24 , a third evaporating device 29 and a fourth evaporating device 36 are mounted on the vacuum chamber wall 35 . Each evaporation device is equipped with an independent gas supply system. A cylindrical partition supporting frame 25 and a plurality of partitions 23 are installed in the vacuum chamber, and the cylindrical partition supporting frame 25 and the partitions 23 divide the vacuum chamber into eight isolation chambers 21 . There are a plurality of openings 27 on the cylindrical partition support frame 25 . A central air extraction pipe 33 is disposed in the cylindrical partition support frame 25 , and there are four first openings 30 and four second openings 32 of the central air extraction pipe 33 . The first openings 30 correspond to the evaporation device, the second openings 32 intersect between the first openings 30 , an...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A multi-layer coated equipment in nanometer level which consists of the following parts: evacuated chamber, cylinder framework for clapboard with aperture, at least four pieces of clapboards which were fixed on cylinder framework, dividing the evacuated chamber into at least four disconnecting chambers, central pump-line with aperture , at least two evaporating plants and one ion source which were fixed on evacuated chamber wall, at least four work rests each of which was fixed in one disconnecting chamber separately, single-core multi-spindle magneto fluid gearing and bleeding point. All the clapboards, cylinder framework and work rests can do synchronous revolution by sharing one revolution axis. This equipment can be used to deposit multilayer membrane in nanometer level and to modulate membrane composition and thickness. Advantages are component singleness in each membrane and sharp and clear interface among different membranous layers. It can be used in surface peening of die and other parts.

Description

technical field [0001] The invention relates to a film coating device capable of depositing nanometer multi-layer film for strengthening the surface of a mold. Background technique [0002] As an advanced material surface modification technology, physical vapor deposition has been widely used in various fields of national economy. In the past two decades, TiN-based single-layer films have been widely used in the decoration industry. The rapid development of China's manufacturing industry has put forward higher and higher requirements on the hardness and wear resistance of processing and forming tools such as tools and molds, and other mechanical parts, and the single-component film layer often cannot meet these requirements. Since the multilayer film contains two or more layers of materials, it is often better than a single film layer in terms of hardness, wear resistance, impact resistance, and corrosion resistance. Patent CN1156598C discloses a multi-layer composite film...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22C23C14/24C23C14/35C23C14/50
Inventor 徐健程云立张云龙
Owner 北京东方新材科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com