Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure

A technology of cold plasma and channel structure, which is applied in the manufacture of plasma, discharge tubes, semiconductor/solid-state devices, etc., can solve the problems of limiting the effective distance of active particles in cold plasma, increasing the cost of use, etc., so as to improve the effective space Movement distance and effective space range, the effect of increasing jet velocity

Active Publication Date: 2006-08-02
WUXI RES INST OF APPLIED TECH TSINGHUA UNIV
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, in existing atmospheric pressure cooled plasma generators, whether it is a flat-plate cold plasma generator or a coaxial cold plasma generator, the control of the flow rate of the cold plasma jet can only be achieved by increasing the flow rate of the working gas. This greatly limits the effective distance of the active particles in the cold plasma, and also greatly increases the cost of the technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure
  • Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure
  • Atmospheric discharging cold plasma generator and array based on contraction and enlargement channel structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] The present invention adopts such as figure 1 Scaled channel shown. By adjusting the intake pressure and scaling the cross-sectional area of ​​the throat of the channel (at the minimum cross-section of the channel), the airflow reaches the local sound velocity at the throat. In the subsequent expansion stage, the flow velocity will increase with the increase of the nozzle cross-sectional area, so as to realize the quality Significantly increase the gas outlet flow rate with a small increase in flow rate. The scaling structure of the scaling channel can be applied at the inlet of the cold plasma generator, the discharge and the gas outlet, and the cross section of the scaling channel can be made into a circular, square, or elliptical shape, all of which can realize the improvement of gas The purpose of outlet flow rate.

[0050] Figure 2-11 The typical application of the scaling channel structure design on some atmospheric pressure discharge cold plasma generators is...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A cold plasma generator of atmosphere discharge is featured as setting flat-plate type or rotation type of contraction and enlargement channel structure at air inlet or air outlet or discharge region of generator to form flat-plate type or coaxial type cold plasma generator of atmosphere discharge and furthermore to form generator array .The said contraction and enlargement channel structure is formed by compression unit, throat unit and expansion unit to raise efflux velocity of cold plasma at outlet of said generator .

Description

technical field [0001] The invention relates to the technical field of atmospheric pressure discharge cold plasma generators. Background technique [0002] At present, a large area of ​​non-equilibrium cold plasma can be generated under low pressure conditions, but the existence of the vacuum chamber, on the one hand, greatly increases the manufacturing and maintenance costs of the equipment, on the other hand, it also limits the geometric size of the workpiece to be processed, thus This greatly limits its scope of application. At present, there are two types of plasma that can be generated under atmospheric pressure conditions. One is thermal plasma, which is characterized by high gas temperature, about 10,000K, and is mainly used for plasma spraying, cutting, welding, waste treatment, materials, etc. Surface processing and other fields. Due to the high temperature of hot plasma, it cannot be used for processing materials that are afraid of heat; the other is cold plasma,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/40H05H1/50H05H1/54H01J37/32H01L21/00
Inventor 李和平包成玉孙文廷王华博
Owner WUXI RES INST OF APPLIED TECH TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap