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Scuff resistant compositions comprising ethylene acid copolymers and polyamides

一种共聚物、组合物的技术,应用在装饰膜和保护膜的应用领域,能够解决差光学特性等问题,达到优异耐擦性能、克服划痕和擦伤问题、优异晶态熔融温度的效果

Active Publication Date: 2012-01-25
DOW GLOBAL TECH LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Blending polyamides and ionomers such as those described in U.S. Patent No. 3,317,631 generally results in blends with good scratch resistance and other surface properties, but very poor optical properties (ie, opacity)

Method used

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  • Scuff resistant compositions comprising ethylene acid copolymers and polyamides

Examples

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Embodiment

[0065] The following examples are for illustration only and are not intended to limit the scope of the inventions described and / or claimed herein.

[0066] Description of methods and test materials:

[0067] Examples of thermoplastic compositions for the preparation of films, sheets or molded articles of the scratch-resistant and scratch-resistant transparent material of the present invention, the compositions comprising copolymers of ethylene acid and polyamides neutralized with monocarboxylic and dicarboxylic acid monomers mixture. Specific examples are shown in Table 1 below. Table 1 reports polyamides (i.e. Nylon-6) and ethylene acid copolymers neutralized with mono- and dicarboxylic acid monomers (i.e. Anhydride ) blend properties. These blends were prepared by melt mixing the base resins in a 30-mm twin-screw extruder. The polymers used in Table 1 are:

[0068] Nylon-6: Ultramid B3 (from BASF)

[0069] Anhydride A: A terpolymer comprising ethylene, 11% by weigh...

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Abstract

The invention discloses compositions of ethylene acid copolymers and polyamides that are useful for fabricating films, sheets and molded articles for scuff and scratch resistant material and their application as decorative and protective films, comprising (1) from about 30 to about 65 weight % of a polyamide; and (2) from about 70 to about 35 weight % of a copolymer of (a) ethylene; (b) from about 5 weight% to about 15 weight % of an alpha, beta-unsaturated C3-C8 carboxylic acid; (c) from about 0.5 weight % to about 12 weight % of at least one comonomer that is an ethylenically unsaturated dicarboxylic acid; and (d) from 0 weight % to about 30 weight % of monomers selected from alkyl acrylate and alkyl methacrylate, wherein the alkyl groups have from one to twelve carbon atoms; at least partially neutralized by one or more alkali metal, transition metal, or alkaline earth metal cations. Articles prepared from these compositions, such as films, show high toughness, good mechanical properties, excellent scratch and scuff resistance and, most importantly, good optical properties. More particularly, the compositions of ethylene copolymers and polyamides of the present invention can be used as protective coatings or layers on scuff- and scratch-exposed objects.

Description

field of invention [0001] The present invention relates to compositions of ethylene acid copolymers and polyamides for the preparation of films, sheets and molded articles of scuff and scratch resistant material, and their use as decorative and protective films. More particularly, the present invention relates to articles prepared from these compositions having transparent decorative and protective surfaces which exhibit enhanced scratch and scuff resistance. Background technique [0002] As a result of several new approaches, polymer films are more frequently replacing coatings for surface decoration and protection. For example, polymer film decoration increasingly offers design freedom, is low cost, and is more environmentally compatible than conventional coating methods. The surfaces of many sporting and industrial articles are designed with protective and decorative films. Many applications require new materials with excellent processability, mechanical properties, imp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08L77/00C08L23/08C08J5/18B32B27/32B32B27/08B32B27/34C08L23/02C08L77/02C08L77/06
CPCB32B27/34C08L23/0876B32B27/08C08L77/02C08L77/06B32B27/32C08L23/02C08L77/00C08L2666/20C08L2666/06C08J5/18B32B27/20B32B2553/00B32B2307/584B32B2419/04B32B37/153B32B2307/412B32B2451/00B32B2377/00B32B2323/04B32B27/308B32B2367/00B32B2307/756B32B2333/12B32B27/36B32B2571/00
Inventor R·T·周K·豪斯曼
Owner DOW GLOBAL TECH LLC
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