Scuff resistant compositions comprising ethylene acid copolymers and polyamides

A technology of composition and copolymer, which is applied in the application fields of decorative films and protective films, can solve problems such as poor optical properties, achieve excellent abrasion resistance, excellent crystalline melting temperature, and overcome the effects of scratches and abrasions

Active Publication Date: 2006-09-13
DOW GLOBAL TECH LLC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Blending polyamides and ionomers such as those described in U.S. Patent No. 3,317,631 generally results in blends with good scratch resistance and other surface properties, but very poor optical properties (ie, opacity)

Method used

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Examples

Experimental program
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Effect test

Embodiment

[0065] The following examples are for illustration only and are not intended to limit the scope of the inventions described and / or claimed herein.

[0066] Description of methods and test materials:

[0067] Examples of thermoplastic compositions for the preparation of films, sheets or molded articles of the scratch-resistant and scratch-resistant transparent material of the present invention, the compositions comprising copolymers of ethylene acid and polyamides neutralized with monocarboxylic and dicarboxylic acid monomers mixture. Specific examples are shown in Table 1 below. Table 1 reports polyamides (i.e. Nylon-6) and ethylene acid copolymers neutralized with mono- and dicarboxylic acid monomers (i.e. Anhydride Surlyn  ) blend properties. These blends were prepared by melt mixing the base resins in a 30-mm twin-screw extruder. The polymers used in Table 1 are:

[0068] Nylon-6: Ultramid B3 (from BASF)

[0069] Anhydride Surlyn  A: A terpolymer comprising ethylen...

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PUM

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Abstract

Disclosed are compositions of ethylene acid copolymers and polyamides that are useful for fabricating films, sheets and molded articles for scuff and scratch resistant material and their application as decorative and protective films, comprising (1) from about 30 to about 65 weight % of a polyamide; and (2) from about 70 to about 35 weight % of a copolymer of (a) ethylene; (b) from about 5 weight % to about 15 weight % of an alpha,ss unsaturated C3-C8 carboxylic acid; (c) from about 0.5 weight % to about 12 weight % of at least one comonomer that is an ethylenically unsaturated dicarboxylic acid; and (d) from 0 weight % to about 30 weight % of monomers selected from alkyl acrylate and alkyl methacrylate, wherein the alkyl groups have from one to twelve carbon atoms; at least partially neutralized by one or more alkali metal, transition metal, or alkaline earth metal cations. Articles prepared from these compositions, such as films, show high toughness, good mechanical properties, excellent scratch and scuff resistance and, most importantly, good optical properties. More particularly, the compositions of ethylene copolymers and polyamides of the present invention can be used as protective coatings or layers on scuff- and scratch-exposed objects.

Description

field of invention [0001] The present invention relates to compositions of ethylene acid copolymers and polyamides for the preparation of films, sheets and molded articles of scuff and scratch resistant material, and their use as decorative and protective films. More particularly, the present invention relates to articles prepared from these compositions having transparent decorative and protective surfaces which exhibit enhanced scratch and scuff resistance. Background technique [0002] As a result of several new approaches, polymer films are more frequently replacing coatings for surface decoration and protection. For example, polymer film decoration increasingly offers design freedom, is low cost, and is more environmentally compatible than conventional coating methods. The surfaces of many sporting and industrial articles are designed with protective and decorative films. Many applications require new materials with excellent processability, me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L77/00C08L23/08C08J5/18B32B27/32B32B27/08B32B27/34C08L23/02C08L77/02C08L77/06
CPCB32B27/08C08L77/02C08L77/00C08L77/06C08L23/0876B32B27/34C08L23/02B32B27/32C08L2666/20C08L2666/06C08J5/18B32B27/20B32B2553/00B32B2307/584B32B2419/04B32B37/153B32B2307/412B32B2451/00B32B2377/00B32B2323/04B32B27/308B32B2367/00B32B2307/756B32B2333/12B32B27/36B32B2571/00
Inventor R·T·周K·豪斯曼
Owner DOW GLOBAL TECH LLC
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