Synthesis method of ternary copolymer containing PEDEK and PEEK using sulfolane as solvent
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 长春吉大特塑工程研究有限公司
- Publication Date
- 2006-12-27
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Abstract
Description
technical field
[0001] The invention belongs to the field of macromolecular materials, and in particular relates to a method for preparing biphenyl-containing polyetheretherketone and polyetheretherketone terpolymer by using a polar solvent, especially sulfolane as a solvent. Background technique
[0002] Polyaryletherketone polymers have a series of excellent comprehensive properties such as high temperature resistance, high strength, and radiation resistance. Its earliest commercialized variety is the well-known polyether ether ketone (PEEK) resin that was first introduced to the market by the British ICl company in 1981. The patent of its preparation method clearly refers to the high-temperature solvent diphenyl sulfone. Because its polymer reaction temperature is above 300°C, other solvents cannot adapt. All of the patents on polyaryletherketone that were applied for later used this solvent. We have also used this traditional high-temperature solvent in the related pa...