Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for manufacturing a conductive composition and a rear substrate of a plasma display

A technology of plasma display and conductive composition, which is applied in the direction of alternating current plasma display panel, conductive material dispersed in non-conductive inorganic material, cold cathode manufacturing, etc., to achieve the effect of high tolerance

Inactive Publication Date: 2007-04-11
EI DU PONT DE NEMOURS & CO
View PDF12 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this reference does not say anything about chemical etch resistance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing a conductive composition and a rear substrate of a plasma display
  • Method for manufacturing a conductive composition and a rear substrate of a plasma display
  • Method for manufacturing a conductive composition and a rear substrate of a plasma display

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0114] A UV photosensitive thick film conductive composition was used in this example.

[0115] Method for Measuring the Average Particle Size of Ag

[0116] The average particle size can be defined as d50, which is obtained by measuring the particle size distribution using the laser diffraction scattering method. Microtrac model X-100 is an example of a commercially available device.

[0117] 0.5 g of powder was weighed and added to a beaker, and then a dispersion medium, which was formed by dissolving 0.2% of a dispersant (Darvan C) in 100 ml of pure water, was added to the beaker. The resulting solution was stirred for 5 minutes with a 200W ultrasonic stirring device. The resulting solution was then measured for 75 seconds using a Microtrac model X-100 to obtain a d50 value. The average particle diameter was obtained from the obtained d50 value.

[0118] A. Preparation of organic medium

[0119] As a solvent, Texanol (2,2,4-trimethyl-1,3-pentanediol monoisobutyrate) an...

Embodiment 2-6 and comparative example 1-5

[0130] A conductive composition was prepared following the same procedure as in Example 1 except that the ingredients were changed to those shown in Table 1.

[0131]

Embodiment 9-12 and comparative example 6-7

[0136] In these Examples and Comparative Examples, the effect of the particle size of the silver powder in the conductive composition of the present invention was examined.

[0137] A conductive composition was prepared following the same procedure as in Example 1 except that the ingredients were changed to those shown in Table 3. Furthermore, chemical etching resistance and resolution evaluated by the following evaluation methods are also shown.

[0138] sample

comparative example

6

Example

9

Example

10

Example

11

Example

12

comparative example

7

Ag PSD(d50)

0.5 micron

1.0 microns

1.5 microns

2.0 microns

2.5 microns

3.0 microns

glass frit

Pb-type

Pb-type

Pb-type

Pb-type

Pb-type

Pb-type

Glass frit temperature (°C)

499

499

499

499

499

499

Glass frit / Ag

1.5 / 98.5

1.5 / 98.5

1.5 / 98.5

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
softening pointaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The present invention relates to a conductive composition for a plasma display panel (hereinafter referred to as PDP). More specifically, the conductive composition of the present invention relates to a conductive composition that has high resistance to an etching liquid and is suitable for forming barrier ribs from a barrier rib material by chemical etching.

Description

technical field [0001] The present invention relates to a conductive composition for a plasma display panel (hereinafter referred to as PDP). More specifically, the conductive composition of the present invention relates to a conductive composition having excellent chemical etching resistance and suitable for forming ribs from a rib material by chemical etching. The present invention also relates to electrodes using the conductive composition, and methods of manufacturing PDP rear substrates containing these electrodes, and plasma displays containing the rear substrate. Background technique [0002] The rear substrate of the PDP is composed of at least address electrodes and barrier ribs on the glass rear substrate, and has a layered structure, wherein phosphors (RGB) are disposed between the ribs. In some cases, a dielectric or insulating layer is formed between the address electrodes and the ribs. [0003] Methods for forming ribs on the rear substrate of the PDP include...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01B1/16C03C3/04H01J17/04H01J9/02H01J9/24H01J9/00H01J11/12H01J11/22H01J11/24H01J11/26H01J11/34H01J11/36
CPCC23C28/00H01J11/26H01J2211/225H01B1/16C23C28/324H01J9/02C03C8/10H01J9/242C23C28/04H01J11/12C03C8/18
Inventor 赵镛佑李智渊土屋元彦
Owner EI DU PONT DE NEMOURS & CO