Decompression processing device

A processing device and processing space technology, applied in the direction of pretreatment surface, device for coating liquid on the surface, ion implantation plating, etc., can solve the problems of pattern generation, attraction deviation, etc.

Inactive Publication Date: 2007-05-09
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0009] Although it is also conceivable to set up a plurality of suction parts connected to the vacuum device, even so, since the distance from the main exhaust pipe to each suction part is not equal, the suction will deviate, and as a result, patterns will occur.

Method used

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Embodiment Construction

[0023] Embodiments of the present invention will be described below with reference to the drawings.

[0024] 1 is an overall side view of a film forming apparatus equipped with a reduced pressure treatment device of the present invention, FIG. 2 is a plan view showing the reduced pressure treatment device of the present invention, and FIG. 3 is a partially enlarged cross-sectional view of the reduced pressure treatment device.

[0025] In FIG. 1 , 1 is a reduced-pressure processing device according to this embodiment, and 100 is a coating device for coating a coating liquid such as a resist on the surface of a substrate W such as a glass substrate. The substrate W supplied with the coating liquid on the surface by the coating device 100 is sent into the decompression treatment device 1 by the robot 200, and the coating liquid on the surface of the substrate W is dried to form a coating film by the decompression treatment device 1, and then The substrate W on which the coating ...

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Abstract

Disclosed is a decompression processing device for forming uniform envelope on large scale glass substrate. Auxiliary exhaust ducts (9) branching from primary exhaust duct (8, 8) extend along the upper surface of a case body (3), suction parts (10) having opening to decompression processing space in the case body (3) are mounted at front end of each auxiliary exhaust ducts (9). The suction parts (10) are arranged at a position symmetric in both sides of the axes as reference in overlook observation. The suction parts (10) are arranged in such positions that even vacuum is drawn in the decompression processing space within a short time, temperature non-uniformity can be prevented.

Description

technical field [0001] The present invention relates to a reduced-pressure treatment device for drying a coating liquid coated on, for example, a glass substrate to form a film. Background technique [0002] The technique disclosed in Patent Document 1 is known as a conventional technique for forming a film such as a resist film or a color filter film on the surface of a glass substrate. [0003] In the apparatus disclosed in this Patent Document 1, a technique is disclosed in which a coating station is provided on a production line for conveying glass substrates from an upstream side to a downstream side, and a coating station on the downstream side of the coating station Multiple decompression drying stations are set up in series on the production line. Substrates that have not been processed by the decompression drying device on the upstream side are processed by the decompression drying device on the downstream side. Robots for complicated operations are not required, sh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C9/12B05D3/00C03C17/00
CPCB05C9/12C23C14/56F26B5/04H01L21/027
Inventor 楫间淳生高濑真治升芳明
Owner TOKYO OHKA KOGYO CO LTD
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