Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample

A workbench and component technology, applied in scientific instruments, electrical components, semiconductor/solid-state device manufacturing, etc., can solve problems such as uneven processing results

Active Publication Date: 2007-05-09
FEI CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, anisotropic irradiation of such ions can produce very non-uniform processing results when the sample is viewed with an electron beam

Method used

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  • Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample
  • Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample
  • Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating sample

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Figure 1 shows a partial front view of one embodiment of a particle optics device 1 and stage assembly 3 of the present invention. Workbench assembly 3 among the figure is made up of following elements:

[0046] - a sub-table 5 that can move back and forth along the direction dx parallel to the X-axis;

[0047] - the main rotating part 7 mounted on the sub-table 5 for rotating the frame 9 around the main axis PA parallel to the X-axis;

[0048] - a part 11 supported by the frame 9 for moving the slide 13 back and forth in translation relative to the frame 9 in a direction dy parallel to the Y-axis;

[0049] - a Z-member 15 supported by a slide 13 for rotating the platform 17 about the axis of rotation RA and for translation of the platform 17 along this axis of rotation RA. With reference to the frame 9, the axis of rotation RA is parallel to the Z-axis.

[0050] - A turning member 19 supported by the platform 17 for rotating the sample stage 21 about the turning axi...

Embodiment 2

[0059] Another embodiment of the particle optics device and workbench assembly of the present invention is the same as Embodiment 1 above, except that the frame 9 cannot rotate around the main axis. In such a non-concentric arrangement, the axis of rotation RA is permanently parallel to, for example, the first axis A 1 .

Embodiment 3

[0061] Another embodiment of the particle optical device and workbench assembly of the present invention is the same as the above-mentioned embodiment 1, except that the workbench assembly 3 is equipped with an additional mechanism 3' on the slide plate 13. The sample stage 21 among Fig. 1 and 2 is used to support very small microscopic size (for example 30 * 30 * 0.1 μ m 3 ) sample, and the sample holder 21B in the additional mechanism 3' is used to support bulky samples, such as the major part of a whole semiconductor wafer (such as diameter 100mm and thickness 1.2mm). To this end, the mechanism 3' comprises a large-dimension Z-part 15B supported by the slide 3 for rotating the sample carrier 21B around the mass axis of rotation 25 and for aligning the sample carrier 21B along the mass axis of rotation 25. move. This mass axis of rotation 25 is parallel to the axis of rotation RA and is a fixed distance away from it. In this case, the stroke of the Y component is sufficien...

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Abstract

A particle optics device comprising: a first source for generating a first radiation beam (E) along a first axis (A1); a second source for generating a second radiation beam (I) along a second axis (A2) ), the second axis intersects the first axis at the beam intersection, and the first and second axes (A1, A2) define a beam plane. Stage assembly (3), which positions the sample near the beam intersection point (c), this assembly includes: a sample stage (21) on which the sample can be mounted; a set of actuators, which enables the sample stage (21) to move in the Translation of: the X-axis substantially parallel to the vertical beam plane, the Y-axis parallel to the beam plane, and the Z-axis parallel to the beam plane, the X-axis, Y-axis and Z-axis are perpendicular to each other and pass through The beam intersection point (c). It is characterized in that the set of actuators is mounted so that: the sample stage (21) rotates around a rotation axis (RA) substantially parallel to the Z-axis, and the sample stage (21) rotates around a rotation axis (RA) substantially perpendicular to the Z-axis FA) rotation, wherein the turning axis (FA) itself can rotate about the rotation axis (RA).

Description

technical field [0001] The present invention relates to a bench assembly which positions a sample near a reference point, the assembly comprising: [0002] - A sample stage where samples can be installed; [0003] - a group of actuators, it can make the sample stage translate along the following directions: the X-axis parallel to the vertical reference plane, the Y-axis parallel to the reference plane, and the Z-axis parallel to the reference plane, the X - axis, Y-axis and Z-axis are perpendicular to each other and pass through this reference point. [0004] The invention also relates to a particle optics device comprising: [0005] - a first source for generating a first radiation beam along a first axis; [0006] - a second source for generating a second illumination beam along a second axis, the second axis intersecting the first axis at a beam intersection, the first and second axes defining a beam plane; [0007] - a bench assembly as described in the opening paragra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N35/00G01N13/00H01J37/20
CPCH01L21/68G01R31/2898H01J37/20H01J37/3005H01J37/3056H01J2237/201H01J2237/202H01J2237/20207H01J2237/20214H01J2237/20221H01J2237/20242H01L21/68764
Inventor H·G·塔佩尔I·J·B·希斯范D·兰克斯G·N·A·维恩范R·杨L·A·吉安努兹
Owner FEI CO
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