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Nitride semiconductor laser device and method of manufacturing the same

A technology of nitride semiconductors and lasers, which is applied in the direction of semiconductor lasers, lasers, laser components, etc., and can solve problems such as increasing the driving voltage level, deterioration or serious segregation

Inactive Publication Date: 2007-05-09
SAMSUNG LED CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Degradation or segregation becomes more severe for LDs at visible wavelengths with larger amounts of In and lower active layer growth temperatures
In addition, due to the large amount of Al or the large thickness of the cladding layer 70, the active layer 50 is prone to strain or rupture, thereby increasing the magnitude of the driving voltage

Method used

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  • Nitride semiconductor laser device and method of manufacturing the same
  • Nitride semiconductor laser device and method of manufacturing the same
  • Nitride semiconductor laser device and method of manufacturing the same

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Embodiment Construction

[0031] A semiconductor laser device and a method of manufacturing the same according to preferred embodiments of the present invention will now be described more fully with reference to the accompanying drawings. However, this invention may be embodied in many different forms and should not be construed as limited to only the embodiments set forth herein. That is, the semiconductor laser device according to the present invention may have various stacked structures other than those described here.

[0032]2 is a cross-sectional view of a semiconductor laser device having a metal layer and a metal-based cladding layer according to an embodiment of the present invention. 2, a semiconductor laser device includes a substrate 100, and an n-material layer 110, an n-cladding layer 120, an n-optical waveguide layer 130, an active region 140, a nitride semiconductor layer ( p-waveguide layer) 150 , metal layer 160 and metal base cladding layer 170 . The metal layer 160 and the metal-b...

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Abstract

A semiconductor laser device is provided. The semiconductor laser device includes a substrate, and an n-material layer, an n-clad layer, an n-light waveguide layer, an active region, a nitride semiconductor layer, a metal layer and a metal-based clad layer sequentially formed on the substrate. The metal layer and the metal-based clad layer have a ridge shape and a current blocking layer is formed on sidewalls of the metal layer and the metal-based clad layer and an exposed surface of the nitride semiconductor layer. A p-electrode layer is formed on the ridge shaped metal layer and the current blocking layer. The semiconductor laser device uses the metal-based clad layer instead of AlxInyGa1-x-yN-based p-clad layer, thus preventing degradation of the active region. The semiconductor laser device also includes the thin metal layer between the metal-based clad layer and a p-GaN material of the nitride semiconductor layer, thus reducing contact resistance therebetween. Thus, it is possible to fabricate a high power, low voltage semiconductor laser device having a visible light wavelength.

Description

technical field [0001] The present invention relates to a semiconductor laser device and a manufacturing method of the semiconductor laser device, more specifically, to a semiconductor laser device that uses a metal contact layer and a conductive metal-based material as a cladding layer to replace an AlGaN-based material and a manufacturing method thereof . Background technique [0002] Semiconductor laser devices utilizing GaN stand out not only as promising light sources for optical systems for recording and / or reproducing high-density optical information recording media, but are also attracting attention as new blue and green laser light sources in the field of laser displays , wherein the high-density optical information recording medium is, for example, Blu-ray Disc (BD) or High-Definition Digital Versatile Disc (HD-DVD). [0003] FIG. 1 is a cross-sectional view of a typical semiconductor laser diode. Referring to FIG. 1, a typical semiconductor laser diode (LD) incl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/22H01S5/343H01S5/00
CPCH01S5/0425H01S5/2214H01S5/22H01S5/3214H01S5/34333H01S5/2009H01S5/20H01S5/3216B82Y20/00H01S5/04253H01S5/04254
Inventor 河镜虎柳汉烈
Owner SAMSUNG LED CO LTD