Probe carrier, probe fixing carrier and method of manufacturing the same

Abstract

A carrier having indexes in a probe non-fixing region is used and solutions containing probes are applied to respective specific positions on the carrier by referring to said indexes and fixed. The position of a target compound that is specifically bonded to a probe fixed to a probe carrier manufactured by a method according to the invention can be accurately and quickly detected by referring to the indexes.

Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] This invention relates to a method of manufacturing a probe carrier by applying a probe solution to a specific position on a carrier, utilizing one or more than one indexes and an ink-jet method in particular. It also relates to a probe carrier manufactured by such a manufacturing method and a method of identifying the position of the target substance bonded to the probe on such a probe carrier by utilizing such indexes.

[0003] 2. Related Background Art

[0004] When analyzing the base sequence of a gene DNA or conducting a gene diagnosis for a number of items simultaneously, probes of different types are needed to single out a DNA having a target base sequence in order to raise the reliability of operation. DNA microchips have been attracting attention as means for providing probes of a number of different types to be used for such sorting operations. A large number of solution specimens (e.g., 96, 384 or 1,536 speci...

Examples

example 1

[0120] Black resist containing carbon black (“CK-A143B”: tradename, available from FUJIFILM Arch Co., Ltd.) was applied onto a glass substrate (“1737”: tradename, available from Corning), exposed to light by means of a UV aligner in a predetermined manner, developed by means of an aqueous solution of inorganic alkali and subjected to a post bake treatment in which it was heated in a clean oven at 220° C. for 60 minutes to prepare a black matrix pattern (division wall) having a film thickness of 2 μm and rectangular openings of 100 μm×200 μm. Along with the black matrix pattern, two cross-shaped indexes having a transversal part that was 30 μm wide and 150 μm long and a vertical part that was also 30 μm wide and 150 μm long were formed at two corners of a peripheral part of the chip (see FIG. 1).

[0121] Subsequently, fluorescent coloring matter rhodamine B was dissolved into a solvent to be used for ejecting the coloring matter by a liquid ejection head that contains glycerol by 7.5 ...

example 2

Evaluation of Color Mixture by Hybridization

[0123] A glass substrate was cleansed as in Example 1. Subsequently, an aqueous solution containing an aminosilane coupling agent (KBM-603: tradename, compound I, available from Shinetsu Chemical Co., Ltd.) expressed by chemical formula (I) of

(CH3O)3SiC3H6NHC2H4NH2  (I)

that had been refined by distillation under reduced pressure to a concentration of 1% was stirred at room temperature for an hour to hydrolyze the part of the methoxy group. Then, the substrate was dipped into the aqueous solution of the silane coupling agent immediately after the cleansing at room temperature for an hour. Subsequently, the substrate was washed with flowing water (ultrapure water) and dried by blowing nitrogen gas. Then, it was heated to fix the coupling agent at 120° C. in an oven.

[0124] After cooling the substrate, it was immersed into a 0.3% solution (ethanol:dimethylsulfoxide=1:1) of N-(6-maleimidecaproxy)succinimide (EMCS: compound II)

[0125] for ...

example 3

[Formation of Black Matrix]

[0133] Black resist (CK-A143B Resist: tradename, available from FUJIFILM Arch Co., Ltd.) containing carbon black was applied onto a glass substrate (1737: tradename, available from Corning) and subjected to a predetermined exposure session using a UV aligner and a developing operation using an inorganic aqueous alkali solution. Then, the substrate was heated in a clean oven at 220° C. for 60 minutes and subjected to a post bake treatment to prepare a black matrix pattern (division wall) having a film thickness of 2 μm and rectangular openings of 100 μm×200 μm. The length a of the division wall was made equal to 20 μm.

[Evaluation of Surface Coarseness]

[0134] The surface coarseness of the glass substrate used for forming the black matrix was observed at arbitrarily selected areas by using NanoScope IIIa AFM Dimension 3000 Stage System (tradename, available from Digital Instrument) before forming the black matrix. As a result, the substrate showed an avera...

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] This invention relates to a method of manufacturing a probe carrier by applying a probe solution to a specific position on a carrier, utilizing one or more than one indexes and an ink-jet method in particular. It also relates to a probe carrier manufactured by such a manufacturing method and a method of identifying the position of the target substance bonded to the probe on such a probe carrier by utilizing such indexes.

[0003] 2. Related Background Art

[0004] When analyzing the base sequence of a gene DNA or conducting a gene diagnosis for a number of items simultaneously, probes of different types are needed to single out a DNA having a target base sequence in order to raise the reliability of operation. DNA microchips have been attracting attention as means for providing probes of a number of different types to be used for such sorting operations. A large number of solution specimens (e.g., 96, 384 or 1,536 speci...

Examples

example 1

[0120] Black resist containing carbon black (“CK-A143B”: tradename, available from FUJIFILM Arch Co., Ltd.) was applied onto a glass substrate (“1737”: tradename, available from Corning), exposed to light by means of a UV aligner in a predetermined manner, developed by means of an aqueous solution of inorganic alkali and subjected to a post bake treatment in which it was heated in a clean oven at 220° C. for 60 minutes to prepare a black matrix pattern (division wall) having a film thickness of 2 μm and rectangular openings of 100 μm×200 μm. Along with the black matrix pattern, two cross-shaped indexes having a transversal part that was 30 μm wide and 150 μm long and a vertical part that was also 30 μm wide and 150 μm long were formed at two corners of a peripheral part of the chip (see FIG. 1).

[0121] Subsequently, fluorescent coloring matter rhodamine B was dissolved into a solvent to be used for ejecting the coloring matter by a liquid ejection head that contains glycerol by 7.5 ...

example 2

Evaluation of Color Mixture by Hybridization

[0123] A glass substrate was cleansed as in Example 1. Subsequently, an aqueous solution containing an aminosilane coupling agent (KBM-603: tradename, compound I, available from Shinetsu Chemical Co., Ltd.) expressed by chemical formula (I) of

(CH3O)3SiC3H6NHC2H4NH2  (I)

that had been refined by distillation under reduced pressure to a concentration of 1% was stirred at room temperature for an hour to hydrolyze the part of the methoxy group. Then, the substrate was dipped into the aqueous solution of the silane coupling agent immediately after the cleansing at room temperature for an hour. Subsequently, the substrate was washed with flowing water (ultrapure water) and dried by blowing nitrogen gas. Then, it was heated to fix the coupling agent at 120° C. in an oven.

[0124] After cooling the substrate, it was immersed into a 0.3% solution (ethanol:dimethylsulfoxide=1:1) of N-(6-maleimidecaproxy)succinimide (EMCS: compound II)

[0125] for ...

example 3

[Formation of Black Matrix]

[0133] Black resist (CK-A143B Resist: tradename, available from FUJIFILM Arch Co., Ltd.) containing carbon black was applied onto a glass substrate (1737: tradename, available from Corning) and subjected to a predetermined exposure session using a UV aligner and a developing operation using an inorganic aqueous alkali solution. Then, the substrate was heated in a clean oven at 220° C. for 60 minutes and subjected to a post bake treatment to prepare a black matrix pattern (division wall) having a film thickness of 2 μm and rectangular openings of 100 μm×200 μm. The length a of the division wall was made equal to 20 μm.

[Evaluation of Surface Coarseness]

[0134] The surface coarseness of the glass substrate used for forming the black matrix was observed at arbitrarily selected areas by using NanoScope IIIa AFM Dimension 3000 Stage System (tradename, available from Digital Instrument) before forming the black matrix. As a result, the substrate showed an avera...

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