Method and system for managing, analyzing and automating data in the production of semiconductor wafers and for monitoring the production process

Abstract

A system for integrating semiconductor wafer data for use in silicon manufacturing and device fabrication processes, the system including: a data acquisition system 00 capable of acquiring scan data from differing types of semiconductor wafer scanning tools such as wafer dimensional tools 10, wafer inspection tools 12, and wafer nanotopography tools 14, a buffer system 02 for providing temporary storage for scan data transmitted and for providing fault tolerance; a server system 04 for providing storage for the scan data transmitted from the buffer system 02 and for converting the scan data into a format used by and stored in a database 08 management system; and an analysis system 06, the analysis system 06 and the server system 04 providing wafer data management, process monitoring, wafer data analysis, and data automation.

Description

TECHNICAL FIELD [0001] The present invention is directed to the field of materials processing, and more particularly to a method and system for managing, analyzing and automating wafer data in the production of semiconductor wafers and for monitoring the production process. BACKGROUND [0002] The manufacturing of semiconductor wafer and integrated circuits has traditionally employed several types of systems and tools to provide quality control and process monitoring. [0003] For example, wafer geometry systems, ranging from the tabletop gauges to high volume multi-functional sorting systems on state of the art robotic transfer platforms, are used to obtain wafer characterization data to provide an accurate knowledge of wafer dimensional characteristics such as flatness, diameter, thickness, bow, warp, shape, nanotopography, resistivity, backgrind characteristics, thermal shape change, among others. In addition, surface inspection systems are used to identify defects occurring on a sur...

AI Technical Summary

Benefits of technology

[0009] The present invention provides an integrated semiconductor production system for performing wafer data management, process monitoring, data analysis, and data automation, allowing for detailed offline analysis of wafers based on data acquired from both wafer dimensional and surface inspection systems. The integration of wafer data management, process monitoring, data analysis, and data automation for both defect and dimensional tools allows the identification of process-related problems, determination of the origin of those problems, and evaluation of the impact of those problems on manufacturing yields.

[0011] The integrated system allows the building of a database of wafer data using the measurement files output by multiple wafer production systems. Querying is provided to create and save datasets using criteria based on metrology values, identification of when the data was acquired or wafer equipment, or process labels. Thumbnail images of and measurement results for specified datasets can be viewed and sorted, the results exported to file, or wafers selected for use in a chart, report or wafer map. Layouts comprising saved sets of setup parameters that define datasets, charts, reports, wafer maps and activities may be saved. Such layouts may be created and shared among multiple system users.

[0013] The integration of wafer data management, process monitoring, data analysis, and data automation into one system allows improved metrology and inspection tool use, allowing for surface inspection and characterization of both thin film devices and bare wafers with the same system. With the system, engineering focus changes from data collection to process optimization. Process excursions are identified more quickly, resulting in reduction in impact of the excursion on work in progress. Report preparation is automated, and paper based quality records are eliminated.

Problems solved by technology

However, with the wide variety of and large amounts of data from the numerous tools used in the manufacturing of semiconductor wafer and integrated circuits, managing, analyzing and automating wafer data has become extremely complicated.

In the past, wafer data management and analysis systems have been developed for dimensional systems, but they have not included data from surface inspection systems such as defect evaluation systems.

Defect evaluation systems were developed, but they did not support wafer characterization tools or automation features.

Because the disparities between the data from the numerous systems, the ability of engineering to use all of the data available to it to optimize manufacturing processes was limited.

In addition, given the large amounts of data developed by each of the numerous tools, it has become apparent that traditional methods of managing older data are inadequate.

Analyzing and automating wafer data has become extremely complicated.

Further, cross-site transfer of data and review of data from multiple fabrication processes in order to control production across several manufacturing processes, while theoretically possible, was rendered practically difficult by the sheer amount of data and wide variation in types of data to be transferred and reviewed.

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