Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder

Abstract

A substrate support assembly positively secures a substrate holder support to a rotation shaft with respect to rotationally applied forces. A substrate holder support is configured to have an opening in a socket into which, when aligned with an indentation in the rotational shaft to form a passage, a retaining member is removably inserted to engage both the socket opening and the shaft indentation. Methods of rotating a substrate while minimizing rotational slippage of the substrate holder support with respect to the shaft are also provided.

Description

REFERENCE TO RELATED APPLICATION [0001] This application is a continuation of and claims priority to co-pending U.S. patent application Ser. No. 10 / 769,549, filed Jan. 30, 2004, the entire disclosure of which is incorporated by reference herein.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The invention generally relates to the field of substrate processing and, more particularly, to apparatuses and methods for preventing relative rotation of a vertical support shaft and a support structure for a wafer holder. [0004] 2. Description of the Related Art [0005] In the processing of substrates, such as semiconductor wafers, a substrate or wafer holder is generally employed inside a reaction chamber to both evenly support a wafer and to ensure even heat distribution across the surface of the wafer. If the wafer holder helps to attract radiant energy, it is called a susceptor. The susceptor or wafer holder is supported by an underlying support (e.g., a quartz “spider”...

AI Technical Summary

Benefits of technology

[0008] The present invention addresses the aforementioned problems, among others, by providing apparatuses and methods of rotationally locking the wafer holder support (or “spider”) to the shaft. Advantageously, implementation of a wafer holder support rotationally locked to the shaft aids in the prevention of undesirable rotational slippage, thereby ensuring appropriate substrate or wafer orientation. In addition, preferred embodiments of the present invention can be freely lifted in a vertical direction, even when the wafer holder support is rotationally locked to the shaft. Preferred embodiment also decrease wafer holder support wobble, thereby helping to ensure uniform deposition. Preferred embodiments also reduce the likelihood of undesirable generation of particulate contaminants generated by friction between shifting components. Preferred embodiments allow for easy assembly and disassembly of the provided parts, in addition to maintaining the productive life of individual parts.

[0015] In another preferred embodiment, a substrate rotating system is provided. The system includes a shaped rotational shaft and a susceptor support correspondingly shaped to be joined with the rotational shaft so as to prevent rotational slippage between the shaft and the susceptor support.

Problems solved by technology

Slippage between a spider socket and the rotation shaft causes polishing of the precisely machined mating surfaces of the shaft and the socket interior, thereby deforming the mating surfaces so that the shaft and the spider socket no longer precisely fit together.

This polishing of the machined surfaces of the shaft and socket interior can lead to further slippage of the surfaces with respect to one another.

In addition, this polishing can also introduce wafer holder wobble.

Rotational slippage of the spider socket with respect to the shaft can also generate particulate contamination by depositing dust around the tubulation on the bottom of the reaction chamber.

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