Semiconductor memory device
a memory device and semiconductor technology, applied in semiconductor devices, semiconductor/solid-state device details, electrical apparatus, etc., can solve the problems of deteriorating the balance of the memory cell as a whole, affecting the access speed and power consumption of the memory cell, and it is difficult to guarantee the stability of the semiconductor memory devi
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first embodiment
[0032]FIG. 4 is a diagram showing a layout of a memory cell of a semiconductor memory device according to the present invention. FIG. 5 is a diagram for explaining various symbols used to indicate a gate polysilicon layer, a gate contact layer, a source / drain contact region, a source / drain region, a well contact region, a cell frame, a P-type well region, and an N-type well region in the layout shown in FIG. 4. In this embodiment, the present invention is applied to a 1RW / 1R RAM. The illustration of the circuit diagram of the memory cell of the 1RW / 1R RAM will be omitted since the circuit diagram is the same as that of the conventional memory cell shown in FIG. 1. In FIG. 4, those parts which are the same as those corresponding parts in FIG. 1 are designated by the same reference numerals, and a description thereof will be omitted.
[0033]In this embodiment, the transistors Trn3 and Trn4 which are connected to the word line WLA and the transistors Trn5 and Trn7 which are connected to ...
second embodiment
[0043]FIG. 9 is a diagram showing a layout of a memory cell of the semiconductor memory device according to the present invention. FIG. 10 is a diagram showing various symbols used to indicate a gate polysilicon layer, a gate contact layer, a source / drain contact region, a source / drain region, a well contact region, a cell frame, a P-type well region, an N-type well region, and a first metal layer of the layout shown in FIG. 9. In addition, FIG. 11 is a diagram showing a layout of power lines in this embodiment. FIG. 12 is a diagram showing various symbols used to indicate a second metal layer, a third metal layer, a first via hole, a second via hole, and a stacked via hole region in the layout shown in FIG. 11. In this embodiment, the present invention is also applied to a 1RW / 1R RAM. The illustration of the circuit diagram of the memory cell of the 1RW / 1R RAM will be omitted since the circuit diagram is the same as that of the conventional memory cell shown in FIG. 1. In FIG. 9, t...
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