Two-Terminal Reversibly Switchable Memory Device

a memory device and two-terminal technology, applied in the field of computer memory, can solve the problems of complex forming process, inherently variable, and inability to achieve consistent device characteristics or stable over long periods, and no one has successfully implemented a metal-insulator-metal structure into a commercial solid-state memory devi

Inactive Publication Date: 2009-12-10
UNITY SEMICON
View PDF102 Cites 26 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, nobody has successfully implemented a metal-insulator-metal structure into a commercial solid-state memory device.
However, the authors caution, “The forming process is complex and inherently variable.
Also tunneling barriers are susceptible to changes in their characteristics when exposed to water vapour, organic species and oxygen . . . . Thus, device characteristics can never be expected to be produced consistently or be stable over long periods without passivation, effective encapsulation and a better understanding of the dynamics of the forming process.”

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Two-Terminal Reversibly Switchable Memory Device
  • Two-Terminal Reversibly Switchable Memory Device
  • Two-Terminal Reversibly Switchable Memory Device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030]In the following description, numerous specific details are set forth to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some or all of these specific details. In other instances, well known process steps have not been described in detail in order to avoid unnecessarily obscuring the present invention.

The Memory Array

[0031]Conventional nonvolatile memory requires three terminal MOSFET-based devices. The layout of such devices is not ideal, usually requiring an area of at least 8f2 for each memory cell, where f is the minimum feature size. However, not all memory elements require three terminals. If, for example, a memory element is capable of changing its electrical properties (e.g., resistivity) in response to a voltage pulse, only two terminals are required. With only two terminals, a cross point array layout that allows a single cell to be fabricated to a s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A memory using mixed valence conductive oxides is disclosed. The memory includes a mixed valence conductive oxide that is less conductive in its oxygen deficient state and a mixed electronic ionic conductor that is an electrolyte to oxygen and promotes an electric field effective to cause oxygen ionic motion.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to computer memory and more specifically to non-volatile memory.[0003]2. Description of the Related Art[0004]Memory can either be classified as volatile or nonvolatile. Volatile memory is memory that loses its contents when the power is turned off. In contrast, non-volatile memory does not require a continuous power supply to retain information. Most non-volatile memories use solid-state memory devices as memory elements.[0005]Since the 1960s, a large body of literature has evolved that describes switching and memory effects in metal-insulator-metal structures with thin insulators. One of the seminal works was “New Conduction and Reversible Memory Phenomena in Thin Insulating Films” by J. G. Simmons and R. R. Verderber in 301 Proc. Roy. Soc. 77-102 (1967), incorporated herein by reference for all purposes. Although the mechanisms described by Simmons and Verderber have since been cast into ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(United States)
IPC IPC(8): G11C11/00H01L45/00G11C7/00
CPCG06F17/5045H01L45/1253G11C13/0007G11C13/0009G11C2213/11G11C2213/31G11C2213/32G11C2213/53G11C2213/54G11C2213/56G11C2213/71G11C2213/79H01L45/1625H01L45/08H01L45/1233H01L45/146H01L45/147H01L27/2436H01L27/2481G11C13/004G11C13/0069G11C2013/0045G11C2013/005G11C2013/009H01L45/085G11C11/5685G06F30/30H10B63/30H10B63/84H10N70/24H10N70/8836H10N70/026H10N70/8833H10N70/826G11C16/02G11C11/42H10N70/245H10N70/828H10N70/841
Inventor RINERSON, DARRELLCHEVALLIER, CHRISTOPHEKINNEY, WAYNELAMBERTSON, ROYSANCHEZ, JR., JOHN E.SCHLOSS, LAWRENCESWAB, PHILIPWARD, EDMOND
Owner UNITY SEMICON
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products