Substrates for High-Efficiency Thin-Film Solar Cells Based on Crystalline Templates

a solar cell and template technology, applied in the field of photovoltaics and solar cells, can solve the problems of reducing cell quantum efficiency, and flat thin-film crystalline silicon substrates having poor mechanical strength for cell and module processing needs, so as to eliminate or reduce disadvantages and problems associated, and reduce manufacturing costs

Inactive Publication Date: 2010-06-17
BEAMREACH SOLAR INC
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  • Abstract
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  • Claims
  • Application Information

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Benefits of technology

[0007]Therefore a need has arisen for a three-dimensional thin-film substrate which provides fabrication process improvements and manufacturing costs reductions for forming a three-dimensional thin-film solar cell (3-D TFSC). In acco

Problems solved by technology

These processes are often costly and difficult.
Also, flat thin-film silicon substrates may have reduced mean optical path length which reduces IR absorption and results in reduced cell quantum efficiency.
And flat thin-film crystalline silicon substrates may

Method used

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  • Substrates for High-Efficiency Thin-Film Solar Cells Based on Crystalline Templates
  • Substrates for High-Efficiency Thin-Film Solar Cells Based on Crystalline Templates
  • Substrates for High-Efficiency Thin-Film Solar Cells Based on Crystalline Templates

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Embodiment Construction

[0032]The following description is not to be taken in a limiting sense, but is made for the purpose of describing the general principles of the present disclosure. The scope of the present disclosure should be determined with reference to the claims. Exemplary embodiments of the present disclosure are illustrated in the drawings, like numbers being used to refer to like and corresponding parts of the various drawings.

[0033]FIG. 1A illustrates a partial view of a re-usable mono-crystalline silicon template with hexagonal-prism posts disclosed in U.S. Pat. Pub. No. 2008 / 0264477A1. The hexagonal pillars are etched by deep-reactive ion etching (DRIE) with photolithographically patterned photoresist as the hard masking layer. The DRIE etching provides well defined high-aspect ratio gaps between the pillars, however the narrow gaps are difficult to fill by the epitaxial silicon growth and it is difficult to release the epitaxial layer from such a template.

[0034]FIG. 1B illustrates a parti...

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Abstract

A three-dimensional thin-film semiconductor substrate having a plurality of ridges on the surface of the semiconductor substrate which define a base opening of an inverted pyramidal cavity and walls defining the inverted pyramidal cavity is provided. And a fabrication method for a 3-D TFSS by forming a porous silicon layer on a silicon template having a top surface aligned along a (100) crystallographic orientation plane of the silicon template and a plurality of walls each aligned along a (111) crystallographic orientation plane of the silicon template and forming an inverted pyramidal cavity. The porous silicon layer forms substantially conformal on the silicon template. Then forming a substantially conformal epitaxial silicon layer on the porous silicon layer and releasing the epitaxial silicon layer from the silicon template.

Description

[0001]This application claims the benefit of provisional patent application 61 / 114,378 filed on Nov. 13, 2008, which is hereby incorporated by reference.FIELD[0002]This disclosure relates in general to the field of photovoltaics and solar cells, and more particularly to semiconductor substrates and methods for making semiconductor substrates for use in manufacturing three-dimensional thin-film solar cells.DESCRIPTION OF THE RELATED ART[0003]Current methods for manufacturing a three-dimensional thin-film solar cell (3-D TFSC) include forming a 3-Dimensional thin-film silicon substrate (3-D TFSS) using a silicon template. The template may comprise a plurality of posts and a plurality of trenches between said a plurality of posts. The 3-D TFSS may then be formed by forming a sacrificial layer on the template, subsequently depositing a semiconductor layer, selective etching the sacrificial layer and releasing the semiconductor layer from the template. More specifically, the said semicon...

Claims

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Application Information

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IPC IPC(8): H01L29/04H01L29/06H01L21/20
CPCH01L31/0236H01L31/035281H01L31/068H01L31/18H01L31/1804Y10T117/1092H01L21/3065H01L29/045H01L29/0657H01L31/02363Y02E10/547H01L31/1892H01L31/022425H01L31/182H01L31/056Y02E10/52Y02E10/546Y02P70/50
Inventor WANG, DAVID XUAN-QIMOSLEHI, MEHRDAD M.
Owner BEAMREACH SOLAR INC
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