Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
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synthesis example 1
Synthesis of Alkali-Soluble Resin
[0088]17.46 g of methacrylic acid as an acid group-containing monomer and 32.54 g of benzyl methacrylate as a monomer capable of reacting with the acid group-containing monomer were allowed to react in the presence of AIBN as a reaction initiator. The reaction mixture was refluxed in propyleneglycol monomethylether acetate as a solvent with stirring and 2.75 g of trimethylolpropane trismercaptopropionate (TMMP) as a chain transfer agent was added thereto. The resulting mixture was allowed to react at 70° C. for 9 hours. 0.02 g of methoxyhydroquinone (MEHQ) as a thermal polymerization inhibitor was added to the reaction mixture. After the reaction temperature was raised to 110° C., 8.71 g of glycidyl methacrylate (GMA) was added in the presence of a catalyst. The mixture was reacted for 10 hours to prepare an alkali-soluble resin.
[0089]The alkali-soluble resin was found to have a weight average molecular weight of 10,600 g / mol on a polystyrene basis a...
synthesis example 2
Synthesis of Alkali-Soluble Resin
[0090]17.46 g of methacrylic acid as an acid group-containing monomer and 32.54 g of benzyl methacrylate as a monomer capable of reacting with the acid group-containing monomer were allowed to react in the presence of AIBN as a reaction initiator. The reaction mixture was refluxed propyleneglycol monomethylether acetate as a solvent with stirring and 3.00 g of pentaerythritol tetramercaptopropionate (PEMP) as a chain transfer agent was added thereto. The resulting mixture was allowed to react at 70° C. for 9 hours. 0.02 g of 4-methoxyhydroquinone(MEHQ) as a thermal polymerization inhibitor was added to the reaction mixture. After the reaction temperature was raised to 110° C., 8.71 g of glycidyl methacrylate(GMA) was added in the presence of a catalyst. The mixture was reacted for 10 hours to prepare an alkali-soluble resin.
[0091]The alkali-soluble resin was found to have a weight average molecular weight of 10,500 g / mol on a polystyrene basis as mea...
example 1
Preparation of Photosensitive Resin Composition
[0093]11 g of the alkali-soluble resin prepared in Synthesis Example 1, 50 g of a red pigment dispersion, 13 g of dipentaerythritol hexaacrylate (DPHA) as a polymerizable compound having ethylenically unsaturated bonds, and 2 g of a photopolymerization initiator(Irgacure-369, CIBA Geigy) were mixed in 24 g of propylene glycol monomethyl ether acetate (PGMEA) to prepare a photosensitive resin composition.
[0094]The photosensitive resin composition was found to have a viscosity of 5.8 cps.
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