System and method for fabricating photovoltaic cells
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[0034]An exemplified substrate processing system 300, referring to FIG. 3, includes a chamber 310, a substrate holder 406, a substrate 405 held by the substrate holder 406, a shadow mask 440 held over the substrate 405, and a source unit 320. The source unit 320 can for example include a target 330 for providing a material to be deposited on the substrate 405 and a magnetron 340 configured for providing a magnetic field near a surface of the target 330 where the target material is sputtered off. The source unit 320 can also include an evaporation source, a sublimation source for physical vapor deposition (PVD), a gas distribution plate or a shower head for chemical vapor deposition. The substrate processing system 300 can further include a vacuum pump configured to exhaust air from the chamber 310 to produce a vacuum environment suitable for substrate processing. The chamber 310 can also be filled with a gas to assist substrate processing. The substrate can be held and transported b...
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