Novel alkyl perfluoroalkene ethers

a technology of alkyl perfluoroalkene and ether, which is applied in the preparation of ethers, detergent compositions, organic chemistry, etc., can solve the problems that chlorine-containing compounds such as cfc compounds are considered to be detrimental to the earth's ozone layer
US20110282104A1Inactive Publication Date: 2011-11-17EI DU PONT DE NEMOURS & CO

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
EI DU PONT DE NEMOURS & CO
Publication Date
2011-11-17
Estimated Expiration
Not applicable · inactive patent
Patent Text Reader

Abstract

Disclosed are compositions comprising a compound having the formula CF3(CF2)xCF═CFCF(OR)(CF2)yCF3, wherein R is CH3 or C2H5or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=1, 2 or 3. Also disclosed are unsaturated fluoroethers selected from the group consisting of CF3(CF2)xCF═CFCF(OR)(CF2)yCF3, CF3(CF2)xC(OR)═CFCF2(CF2)yCF3, CF3CF═CFCF(OR)(CF2)x(CF2)yCF3, CF3(CF2)xCF═C(OR)CF2(CF2)yCF3, and mixtures thereof, wherein R can be either CH3, C2H5 or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=0, 1, 2 or 3. Also disclosed herein are novel methods of making a composition comprising at least one of the compounds described.
Need to check novelty before this filing date? Find Prior Art

Description

CROSS REFERENCE(S) TO RELATED APPLICATION(S)

[0001] This application is a continuation of pending U.S. application Ser. No. 12 / 701,802, filed Feb. 8, 2010, which claims the benefit of priority of U.S. Provisional Applications 61 / 152,803, filed Feb. 16, 2009, and 61 / 287,275, filed Dec. 17, 2009.BACKGROUND INFORMATION

[0002] 1. Field of the Disclosure

[0003] This invention relates to cleaning compositions comprising unsaturated fluorocarbon ethers, and methods of their manufacture. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates to novel unsaturated fluorocarbon ethers and their use as cleaning compositions and in the methods listed above.

[0004] 2. Description of the Related Art

[0005] Chlorofluorocarbon (CFC) compounds have been used extensively in the area of semiconductor manufacture to clean surfaces such as magnetic disk media. However, chlorine-containing compou...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More