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Polyimide film

a polyimide film and film technology, applied in the field of polyimide film, can solve the problems of difficult film support only through fixtures or pins, high production equipment of bi-axial stretch technique, and inconvenient maintenance, and achieve excellent young's modulus and good dimensional stability

Inactive Publication Date: 2013-10-24
MORTECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0010]An aspect of the present disclosure provides a method for manufacturing a polyimide film having inorganic particles, so as to obtain a polyimide film with an isotropic thermal expansion coefficient through a uniaxial stretch manner, and the resulted polyimide film has excellent Young's modulus and good dimensional stability. That is, without using a bi-axial stretch technique, the present disclosure can achieve isotropic thermal expansion coefficients and isotropic dimensional variations in both machine direction and transverse direction. The polyimide film having inorganic particles has an available thickness in a range of 12 μm-250 μm.

Problems solved by technology

However, a production equipment of the bi-axial Stretch technique is expensive and is not convenient to maintain.
However if the film has a large thickness for example larger than or equal to 125 μm, due to the weight of the film and the variation of the film under heat, it is difficult to support the film only through the fixtures or pins at two sides thereof.

Method used

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embodiments

[0059]The following embodiments are used for illustrating specific aspects of the present disclosure in details, so that those of ordinary skills in the art of the present disclosure can implement the present disclosure. The following embodiments are not intended to limit the present disclosure.

embodiment 1

[0074]6.98 Kg silicon dioxide powder was added into a solvent of 79.07 Kg Dimethylacetamide (DMAC) with continuous stirring to make the silicon dioxide powder suspend in the DMAC solvent. The particle size of the above silicon dioxide powder was about 1-3 μm. Thereafter, 6.71 Kg ODA was added and dissolved. Afterwards, PDMA was slowly added and stirred for 6 h to perform a polymerization reaction and thus obtaining a polyamic acid solution. The temperature of the above reaction was controlled at 20-30° C.

[0075]It should be noted that since the polymerization reaction was performed with continuous stirring, the silicon dioxide powder was evenly distributed in the polyamic acid solution instead of being precipitated. After the polymerization reaction was completed, the polyamic acid solution has a certain viscosity, so that even when the stirring was stopped, the silicon dioxide powder was not precipitated in a short time by gravity. Furthermore, since in this embodiment, silicon diox...

embodiment 2

[0081]Compared with the embodiment 1, this embodiment mainly changes the adding amount of the silicon dioxide powder. The steps are illustrated in details as follows. 5.66 Kg silicon dioxide powder was added into a solvent of 80.19 Kg DMAC with continuous stirring to make the silicon dioxide powder suspend in the DMAC solvent. The particle size of the above silicon dioxide powder was about 1-3 μm. Thereafter, 6.81 Kg ODA was added and dissolved. Afterwards, PDMA was slowly added and stirred for 6 h to perform a polymerization reaction and thus obtained a polyamic acid solution. The temperature of the above reaction was controlled at 20-30° C. The subsequent steps are the same as these described in embodiment 1. In this embodiment, the weight percentage of the silicon dioxide powder in the polyimide film was about 28.6%.

[0082]In the embodiment 2, the resulted polyimide film was about 50 μm in thickness. The thermal expansion coefficient of the resulted polyimide film at the MD direct...

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Abstract

Disclosed herein is a polyimide film having inorganic particles. The polyimide film is 12-250 μm in thickness. The polyimide film includes about 50-90 weight parts of polyimide and about 10-50 weight parts of the inorganic particles. The particle size of each of the inorganic particles is about 0.1 μm to about 5 μm. The polyimide film is characterized in that the thermal expansion coefficient is equal to or less than 30 ppm / ° C. in any direction, the difference between two thermal expansion coefficients in two mutually perpendicular directions on the film surface is less than 10 ppm / ° C., and the Young's modulus of the polyimide film is greater than 4 GPa in any direction. The dimensional stability of the polyimide film measured by the standard of IPC-TM-650 is less than 0.10% in any direction. A method for manufacturing the polyimide film is disclosed as well.

Description

RELATED APPLICATION[0001]The present application is a divisional of U.S. application Ser. No. 13 / 618,670, filed on Sep. 14, 2012, which claims priority to Taiwan Application Serial Number 100133039, filed Sep. 14, 2011. The entire disclosures of the above applications are hereby incorporated by reference herein.BACKGROUND[0002]1. Technical Field[0003]The present disclosure relates to a polyimide film and a method for manufacturing the same. More particularly, the present disclosure relates to a polyimide film having inorganic particles and a method for manufacturing the same.[0004]2. Description of Related Art[0005]The polyimide polymer is widely applied due to the excellent mechanical strength, insulating property and high temperature resistance thereof, such as a flexible printed circuit (FPC) applied in various electronic products. A general FPC is formed by etching a flexible copper clad laminate (FCCL) into conducting lines connecting with various circuit components and then co...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): B29D7/01
CPCB29D7/01C08J5/18C08G73/1042C08G73/105C08G73/1071C08J2379/08C08K3/36C08L79/08
Inventor HSU, YEN-HUEYSUN, DER-JEN
Owner MORTECH CORP
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