Electroless copper plating solution
a technology of electroless copper and plating solution, which is applied in the direction of liquid/solution decomposition chemical coating, solid/suspension decomposition chemical coating, coating, etc., can solve the problems of significant waste water treatment problems, difficult to form conductive films having high adhesiveness with resin surfaces, and difficult to roughen resin surfaces. , to achieve the effect of high plating rate, good appearance and high adhesiveness
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[0028]The present invention is explained below based on working examples. However, these examples do not limit the scope of the present invention.
working example 4
[0030]The same procedure as in Working Example 1 was carried out except that the following plating bath was used, and the test piece obtained was evaluated. The results are shown in Table 2.
Plating bathCupric chloride dihydrate8.1 g / L (3 g / L as copper)Guanosine 5 mg / LRochelle salt20 g / LSodium hydroxide10 g / LFormaldehyde (23% aqueous20 mL / L (5.0 g / L as formaldehyde)solution)
Table 1
[0031]
TABLE 1Amounts of each compound added (unit: mg / L)Working ExampleComparative Example1234123456Guanosine1020305——————Guanine—————10————Uric acid——————20———Caffeine———————10——N,N′-————————10—bis(hydroxymethyl)ureaAdenine—————————20
Table 2
[0032]
TABLE 2Evaluation resultsWorking ExampleComparative ExampleEvaluation1234123456PeelSubstrate0.6620.7200.6880.6660.5510.709 0.6600.6020.591*strength1(kN / m)Substrate0.4070.5240.5040.4700.3690.5200.4960.3660.389*2Substrate0.3860.4050.4190.2850.2670.3020.2670.3020.280*3Film—0.520.590.470.64 0.570.710.560.540.51*thickness(μm)Appearance—FairlyFairlyFairlyFairlyLightDar...
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