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Method for the removal and recovery of metals and precious metals from substrates

a precious metal and metal complexation technology, applied in the direction of process efficiency improvement, etc., can solve the problems of damage to the substrate, loss of precious metals, and difficulty in separating different precious metals and metals, and achieve high efficiency in metal complexation, low cost, and high purity of the final metal

Inactive Publication Date: 2015-04-02
DEDEK PETR
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This method allows for the efficient and non-damaging removal of metals and precious metals from various substrates, including gold and platinum, with high purity and yield, while avoiding the use of harmful chemicals, and enables the recovery and recycling of substrates, particularly polymeric ones, through a chemical process that preserves the substrate integrity.

Problems solved by technology

Traditionally it has been a challenge to remove thick and or multiple layers of depositions of metals and precious metals from various types of substrates.
Current methods typically involve manually or mechanically removing depositions, including precious metal layers, which can damage substrates.
Traditionally, separating different precious metals and metals has been a challenging if not impossible task.
This has led to the loss of precious metals due to the lack of a viable method to separate then once they have been chemically changed from a metal to a compound in solution.

Method used

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  • Method for the removal and recovery of metals and precious metals from substrates
  • Method for the removal and recovery of metals and precious metals from substrates
  • Method for the removal and recovery of metals and precious metals from substrates

Examples

Experimental program
Comparison scheme
Effect test

example 2

[0026]A 20 mL sample of nitric acid (50%) and 20 mL hydrochloric acid (31%) was prepared in 200 mL N,N-dimethylformamide (DMF). Several pieces of copper wire were added to this solution. The copper wire showed no signs of dissolving within 40 minutes.

example 3

[0027]A sample of 100 mL nitric acid (50%) and 300 mL hydrochloric acid (31%) was prepared in 4 L N,N-dimethylformamide (DMF). A solid piece of copper was coated with an alloy of gold, platinum and titanium. The copper was soaked in the sample solution for fourteen days at room temperature. The copper was removed from the solution and rinsed and manually washed to remove residual protective coating. The resulting copper appeared free of gold, platinum and titanium. There was no visible damage to the copper.

example 5

[0029]A sample of 25 mL phosphoric acid (50%) and 25 mL hydrofluoric acid (50%) was prepared in 400 mL N,N-dimethylformamide (DMF). A piece of aluminum foil was added to this solution. The aluminum showed no signs of dissolving within 20 minutes.

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Abstract

A method for removing metal and / or precious metal-containing depositions from substrates, wherein said substrate is subjected to treatment with an organo amine protectant component P and an inorganic active component A. Component P may be formed in situ by reaction with component R. Component P is an organic amine and / or organic amine hydrochloride (preferably diisopropylamine hydrochloride), component A is an inorganic compound (preferably inorganic acid or a mixture thereof) and component R is an organic compound that can be split along the C—N bond by the component A into an organic amine (preferably dimethylformamide or N-methyl pyrrolidone). The metals in the form of organo-metallic complexes can be isolated and / or separated by means of different chemical reactions (preferably reduction reactions) and / or biosorption (preferably with seaweed or yeast).

Description

FIELD OF THE INVENTION[0001]Traditionally it has been a challenge to remove thick and or multiple layers of depositions of metals and precious metals from various types of substrates. Current methods typically involve manually or mechanically removing depositions, including precious metal layers, which can damage substrates. Other methods can include the use of aggressive or poisonous chemicals to remove the precious metals that can also damage or destroy the substrate or that may not remove the entire deposition from the substrate. Therefore, it was desirable to develop a chemical method to remove layers of depositions, including precious metals, form various types of substrates.[0002]Traditionally, separating different precious metals and metals has been a challenging if not impossible task. This has led to the loss of precious metals due to the lack of a viable method to separate then once they have been chemically changed from a metal to a compound in solution. Therefore, it was...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): C22B3/00C22B1/00C22B3/16
CPCC22B11/04C22B1/005C22B3/16C22B3/24C22B7/007C22B11/042C23F1/30C23F1/44Y02P10/20C22B3/06C22B11/046
Inventor DEDEK, PETRNOBLE, MATTHEW J.
Owner DEDEK PETR