Unlock instant, AI-driven research and patent intelligence for your innovation.

Formation of SiGe Nanotubes

a technology of silicon germanium and nanotubes, applied in the direction of instruments, material analysis, gas analyzer construction details, etc., can solve the problems of insufficient process efficiency and difficulty in achieving nanotubes with consistent dimensions

Inactive Publication Date: 2017-03-09
ELPIS TECH INC
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This method enables the production of SiGe nanotubes with consistent dimensions, compatible with CMOS processes, and suitable for large-scale production, enhancing their application in nanoelectronics and devices like chemical sensors with improved sensitivity.

Problems solved by technology

It is however difficult to achieve nanotubes with consistent dimensions using this type of process, and the process is not efficient enough for large-scale production.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Formation of SiGe Nanotubes
  • Formation of SiGe Nanotubes
  • Formation of SiGe Nanotubes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019]Provided herein are techniques for forming silicon-germanium (SiGe) nanotubes using semiconductor lithography techniques. As will be described in detail below, the present techniques generally involve forming silicon (Si) fins covered with a conformal SiGe layer, and then using an anneal to drive in germanium (Ge) from the SiGe layer into the fins to form a continuous SiGe shell surrounding each of the fins. Selectively removing the Si from the fins results in a hollow SiGe shell which is a nanotube structure. The present SiGe nanotube structures can be used in a variety of different device configurations. For illustrative purposes only, an exemplary chemical sensor device employing the present SiGe nanotubes is presented and described below.

[0020]Advantageously, the present techniques are completely compatible with the current complementary metal oxide semiconductor (CMOS) processes. The present SiGe nanotube arrays can be patterned on a substrate using standard lithography a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
temperatureaaaaaaaaaa
dielectricaaaaaaaaaa
Login to View More

Abstract

Techniques for forming nanostructured materials are provided. In one aspect of the invention, a method for forming nanotubes on a buried insulator includes the steps of: forming one or more fins in a SOI layer of an SOI wafer, wherein the SOI wafer has a substrate separated from the SOI layer by the buried insulator; forming a SiGe layer on the fins; annealing the SiGe layer under conditions sufficient to drive-in Ge from the SiGe layer into the fins and form a SiGe shell completely surrounding each of the fins; and removing the fins selective to the SiGe shell, wherein the SiGe shell which remains forms the nanotubes on the buried insulator. A nanotube structure and method of forming a nanotube device are also provided.

Description

FIELD OF THE INVENTION[0001]The present invention relates to techniques for forming nanostructured materials, and more particularly, to the formation of silicon germanium (SiGe) nanotubes.BACKGROUND OF THE INVENTION[0002]Unlike carbon nanotubes, nanostructures of germanium, a group IV semiconductor, have not been fully explored. Germanium and associated compounds at nanoscale are promising candidates for future nanoelectronics based technologies, e.g., nanotube metal oxide semiconductor field effect transistor (MOSFET) devices, which can extend the device scaling roadmap while maintaining good short channel effects and providing competitive drive current.[0003]Techniques for forming nanotubes from a thin solid film of material have been proposed. See, for example, Schmidt et al., “Nanotechnology: Thin solid films roll up into nanotubes,” Nature 410, 168 (March 2001) which describes a process by which films that are released from a substrate roll up into the shape of a nanotube. It i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): H01L21/02G01N33/00H01L29/06H01L29/161H01L21/306H01L21/324
CPCH01L21/02694B82Y15/00H01L21/02606H01L21/02647H01L21/30604H01L21/324H01L29/0649H01L29/161H01L29/0669G01N33/0036G01N33/005Y10S977/814Y10S977/89Y10S977/90Y10S977/957H01L21/02532H01L21/0245H01L21/02664B82Y30/00H01L21/18H01L29/0676H01L29/165B82Y40/00
Inventor CHENG, KANGGUOHE, HONGKHAKIFIROOZ, ALILI, JUNTAO
Owner ELPIS TECH INC