Formation of SiGe Nanotubes
a technology of silicon germanium and nanotubes, applied in the direction of instruments, material analysis, gas analyzer construction details, etc., can solve the problems of insufficient process efficiency and difficulty in achieving nanotubes with consistent dimensions
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[0019]Provided herein are techniques for forming silicon-germanium (SiGe) nanotubes using semiconductor lithography techniques. As will be described in detail below, the present techniques generally involve forming silicon (Si) fins covered with a conformal SiGe layer, and then using an anneal to drive in germanium (Ge) from the SiGe layer into the fins to form a continuous SiGe shell surrounding each of the fins. Selectively removing the Si from the fins results in a hollow SiGe shell which is a nanotube structure. The present SiGe nanotube structures can be used in a variety of different device configurations. For illustrative purposes only, an exemplary chemical sensor device employing the present SiGe nanotubes is presented and described below.
[0020]Advantageously, the present techniques are completely compatible with the current complementary metal oxide semiconductor (CMOS) processes. The present SiGe nanotube arrays can be patterned on a substrate using standard lithography a...
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