Pixel structure and fabricating method thereof

Abstract

In a fabricating method of a pixel structure, a scan line and a gate electrode are formed in each pixel area of a substrate. A gate insulation layer is formed to cover the scan line and gate electrode. A semiconductor layer is formed on the gate insulation layer above the gate electrode. A data line, source and drain are formed in each pixel area. A first passivation layer covers the data line, source and drain. A common line is formed on the first passivation layer and overlaps with at least a portion of the data line. A common electrode is formed on and electrically connected with the common line. A second passivation layer covers the common electrode and common line. A contact window is formed in the second passivation layer above the drain to expose the drain. A pixel electrode is electrically connected with the drain through the contact window.

Description

CROSS-REFERENCE TO RELATED APPLICATION[0001]This application claims the priority benefit of Taiwan application serial no. 99200888, filed Jan. 15, 2010. The entirety of the above-mentioned patent application is hereby incorporated by reference herein and made a part of specification.BACKGROUND OF THE INVENTION[0002]1. Field of Invention[0003]The invention is related to a pixel structure and a fabricating method thereof, and is particularly related to a pixel structure having a high aperture ratio and favorable display quality and a fabricating method thereof.[0004]2. Description of Related Art[0005]With advantages of high definition, small size, light weight, low driving voltage, low power consumption, and an extensive range of applications, liquid crystal displays (LCD) have replaced cathode ray tube (CRT) displays and have become the mainstream among the latest generation of display products. A conventional liquid crystal panel is formed by a color filter substrate, a thin-film tr...

AI Technical Summary

Benefits of technology

[0011]The invention provides a pixel structure having a higher aperture ratio and superb display quality.

[0012]The invention provides a fabricating method of a pixel structure and increasing production yield.

[0032]In light of the above, in the pixel structure of the invention, the common line is designed to partially overlap with the data line, so that the aperture ratio of the pixel structure is increased. Moreover, the common electrode which is electrically connected with the common line is formed on the common line, so that the electrical field formed between the common electrode and the pixel electrode drives the liquid crystals. Hence the pixel structure provides a wide viewing angle. Furthermore, since the common line and the scan line are not fabricated by the same photomask process, occurrence of a short circuit between the common line and the scan line is prevented, thereby increasing the production yield and enabling the pixel structure to have superb display quality.

Problems solved by technology

Therefore, to maintain the brightness of the pixel structure 100, it is necessary to add light sources in the display device, which is a waste of energy.

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