Hydrothermal Sm2O3 film preparing process
A hydrothermal and thin-film technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve the problems of expensive equipment, high equipment requirements, low raw material utilization rate, etc., and achieve controllable grain growth , High membrane purity, avoid curl effect
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Embodiment 1
[0008] Example 1: First, SmCl 3 ·6H 2 O is dissolved in distilled water and formulated as Sm 3+ A transparent solution with a concentration of 0.05mol / L; heat and stir the solution at 55°C, and adjust the pH value of the solution with a 10% by mass aqueous ammonia solution to make the pH value of the solution 5.6. After stirring for 1 hour, a uniform sol is formed , As a coating solution for use; pour the coating solution into a hydrothermal kettle with a filling degree of 80%, immerse the substrate in the coating solution, then seal the hydrothermal kettle, and place the hydrothermal kettle in a 160°C constant temperature oven. The hydrothermal pressure is controlled at 20MPa, and the heat is kept for 24 hours, and then it is naturally cooled to room temperature; the hydrothermal kettle is opened, the substrate is taken out and placed in an oven at 80°C for 18 hours, and Sm can be obtained on the surface of the substrate 2 O 3 Optoelectronic film.
Embodiment 2
[0009] Example 2: First, SmCl 3 ·6H 2 O is dissolved in distilled water and formulated as Sm 3+ A transparent solution with a concentration of 0.1mol / L; heat and stir the solution at 49°C, and adjust the pH of the solution with 8% by mass ammonia solution to make the pH of the solution 5.9. After stirring for 3 hours, a uniform sol is formed , As a coating solution for use; pour the coating solution into a hydrothermal kettle with a filling degree of 50%, immerse the substrate in the coating solution, then seal the hydrothermal kettle, and place the hydrothermal kettle in a 300℃ constant temperature oven, The hydrothermal pressure is controlled at 8MPa, and the heat is kept for 72 hours and then cooled to room temperature naturally; Sm can be obtained on the surface of the substrate after opening the hydrothermal kettle, taking out the substrate and drying it in an oven at 60°C for 24 hours 2 O 3 Optoelectronic film.
Embodiment 3
[0010] Example 3: First, SmCl 3 ·6H 2 O is dissolved in distilled water and formulated as Sm 3+ A transparent solution with a concentration of 0.08mol / L; this solution is heated and stirred at 45°C, and the pH value of the solution is adjusted with 5% by mass aqueous ammonia solution to make the pH value of the solution 5.8. After stirring for 2 hours, a uniform sol is formed , As a coating solution for use; pour the coating solution into a hydrothermal kettle with a filling degree of 60%, immerse the substrate in the coating solution, then seal the hydrothermal kettle, and place the hydrothermal kettle in a constant temperature oven at 250°C. The hydrothermal pressure is controlled at 15MPa, and the temperature is kept for 36 hours and then cooled to room temperature naturally; Sm can be obtained on the surface of the substrate after opening the hydrothermal kettle, taking out the substrate and drying it in an oven at 100°C for 3 hours 2 O 3 Optoelectronic film.
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