Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for making double-layer alloy plating metallic film resistor

A metal film resistor, alloy coating technology, applied in the manufacture of resistors, non-adjustable metal resistors, resistors, etc., can solve the problems of poor adhesion between the coating and the insulator, the yield of the coating brittle crack, and the decline, so as to overcome the brittleness of the coating. cracked effect

Inactive Publication Date: 2009-01-28
JIANGSU AISEN SEMICON MATERIAL CO LTD
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For this reason, the current useful sputtering method is to plate a nickel-chromium (Ni-Cr) alloy coating on the insulating material, and control the resistance value by controlling its thickness, and process it by laser cutting to achieve accurate resistance value, but Because the coating is hard and brittle, the coating will be brittle during laser cutting and the yield will decrease.
The other is to directly plate copper-nickel (Cu-Ni) alloy coating on the insulating material. Although the resistance value is stable, the bonding force between the coating and the insulator is not as good as the former

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for making double-layer alloy plating metallic film resistor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] As shown in Figure 1, a layer of Ni-Cr alloy 2 is first sputtered on at least one layer of insulating substrate 1, and its composition ratio is Ni:Cr (w / w)=75:25~85:15, and then This Ni-Cr alloy 2 layer is plated one deck Cu-Ni alloy coating 3, and its composition ratio is Cu: Ni (w / w)=60: 40~40: 60; The specific steps of method are to use existing routine The sputtering method, after sputtering a layer of Ni-Cr alloy on at least one layer of insulating film material, then go through the following steps:

[0013] 1. Acid solution activation at room temperature;

[0014] 2. Wash with water;

[0015] 3. Suspension plating or barrel plating of Cu-Ni alloy layer in Cu-Ni alloy plating solution, barrel plating for 0.5-6 hours or longer according to the requirements of resistance value;

[0016] 4. Wash with water;

[0017] 5. Dry.

[0018] The composition of the acid used for activation described in step 1 is hydrochloric acid or sulfuric acid, concentration of hydrochlo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention refers to a manufacturing method for a kind of dual-layer alloy coating layer metal film resistance. The character lies in: a layer of Ni-Cr alloy is splattered onto the at least a layer of insulating base, the proportion is: Ni: Cr (w / w) =75:25-85:15, then a layer of Cu-Ni alloy coating film is coated on the coating layer, the proportion is: Cu: Ni (w / w) =60:40-40:60; the steps are: with the normal spattering method, a layer of Ni-Cr alloy is splattered on the base, then with following steps: the normal temperature activating of acid liquid; rinsing with water; suspending coating or rolling coating the Cu-Ni layer; rinsing with water; drying. The invention solves the bonding force problem between the metal film and the insulating base, overcomes the deficiency that the coating layer is fracture when using laser to process, the temperature coefficient of the resistance film can maintain at + / -2%-+ / -0.5%.

Description

technical field [0001] The invention relates to a method for manufacturing a double-layer alloy coating metal film resistor, in particular to a method for manufacturing a composite alloy metal film resistor in which copper-nickel alloy is electroplated on a nickel-chromium alloy coating layer. Background technique [0002] Metal film resistors are widely used in electrical and electronic circuits. Its precise resistance and stable temperature coefficient make many electrical or electronic circuits work stably at different temperatures. Therefore, the temperature coefficient of resistance is required to be 0.01 / °C the following. For this reason, the current useful sputtering method is to plate a nickel-chromium (Ni-Cr) alloy coating on the insulating material, and control the resistance value by controlling its thickness, and process it by laser cutting to achieve accurate resistance value, but Since this coating is hard and brittle, the coating will be brittle during laser ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01C7/00H01C17/00
Inventor 郑振顾卫忠郭国才
Owner JIANGSU AISEN SEMICON MATERIAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com