Method for preparing pixel structure

Abstract

The invention provides a method for manufacturing a pixel structure, which includes the following steps. Firstly, a gate and a gate insulating layer covering the gate are formed on the substrate. Afterwards, on the gate insulating layer, a semiconductor layer, a conductive layer, and a photosensitive black matrix for accommodating openings in the color filter layer are sequentially formed. The photosensitive black matrix includes a first block and a second block, and the thickness of the first block is less than the thickness of the second block. Afterwards, using the photosensitive black matrix as a photomask, a channel layer, a source electrode and a drain electrode are simultaneously formed on the gate insulating layer above the gate electrode. Next, a protective layer is formed on the film layer, and a color filter layer is formed in the opening of the color filter layer by an inkjet printing process, and a dielectric layer is formed, and a patterning process of the dielectric layer and the protective layer is performed, to expose the drain. Afterwards, a pixel electrode electrically connected to the drain is formed.

Description

technical field [0001] The present invention relates to a method for fabricating a pixel structure, and more particularly to a method for fabricating a pixel structure with a color filter layer using less photolithography and etching process (PEP). Background technique [0002] Liquid crystal displays have the advantages of high image quality, small size, light weight, low voltage drive, low power consumption, and wide application range. Therefore, they have replaced cathode ray tubes (Cathode Ray Tube, CRT) and become the mainstream of the new generation of displays. A traditional liquid crystal display panel is composed of a color filter substrate with a color filter layer, a thin film transistor array substrate (TFT Array Substrate), and a liquid crystal layer arranged between the two substrates. In order to improve the resolution of the panel and the aperture ratio of the pixels, and to avoid alignment errors when the color filter substrate and the TFT array substrate ar...

AI Technical Summary

Problems solved by technology

[0007] Based on the above, the known method of fabricating the color filter layer on the thin film transistor array requires at least seven photolithography and etching processes, and the steps are complicated and require high production costs.

In addition, the above-mentioned pixel structure requiring at least seven photolithography and etching processes needs to use multiple masks with different patterns. Since the mask is very expensive, the manufacturing cost of the pixel structure will not be reduced.

Images