Aligning system and aligning method based on image technique

Abstract

The invention provides an aligning system and method based on image technique. And the system is arranged in a projection exposure device composed at least of light source, mask, mask bearing table, mask bearing table motion controller, optical projection system, exposed object, plate bearing table and plate bearing table motion controller, and comprises at least two position aligners uniformly distributed by using the optical axis of the optical projection system as axis, mask label arranged on the mask, exposed object label arranged on the exposed object, and reference label arranged on the plate bearing table, where the position aligners detect and transmit position information of various labels to the motion controllers to control position adjustment of the mask, exposed object and plate bearing table to align them, and the aligning system is equipped with an aberration compensation lens and a lens calibrating unit corresponding to each position aligner. And the invention can reduce system manufacturing cost and system complexity by adopting narrow waveband design mode and cooperating with the aberration compensation lens.

Description

technical field [0001] The invention relates to the alignment of a packaging photolithography machine, in particular to an alignment system and alignment method based on image technology. Background technique [0002] In lithography packaging equipment, the pins or circuit patterns drawn on the reticle should be imaged on the surface of the exposure object coated with photoresist and other photosensitive materials through the projection exposure device. The silicon wafer where the circuit pattern will be packaged. Afterwards, pins or circuit patterns are formed on the exposed object through a subsequent etching process. [0003] Before using the projection exposure device for exposure, the position of the mask and the exposure object must be aligned. Usually, there are marks for alignment on the side of the mask and the exposure object. Through a certain position alignment device and position alignment method, A relative positional relationship between the mask and the exp...

AI Technical Summary

Problems solved by technology

[0004] In the Chinese patent application number 200610023153, the exposure device in the equipment is designed as a wide-band mode, mainly to eliminate the chromatic aberration problem of the optical projection system in the alignment band, but the manufacturing cost of this exposure device is relatively high, and the design and assembly are complicated

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