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High-purity diamond micropowder and its purification

A technology of diamond micropowder and purification method, which is applied in the field of high chemical purity diamond micropowder and its purification, and can solve the problems of technical description of diamond micropowder products, etc.

Active Publication Date: 2007-09-05
HENAN UNION ABRASIVES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, some progress has been made in the manufacture of diamond powder products with concentrated particle size. For example, Chinese patent CN1447775A describes a method for manufacturing diamond powder in a narrow particle size range, but the technical description of high-purity micro-powder products and how to obtain high-purity Diamond micropowder products have not yet seen relevant reports

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1: Take by weighing 40g of diamond micropowder (arbitrary between 0.1~40 microns of particle size peak value) that the diamond that artificial hydrostatic pressure synthesizes prepares, place in the crucible of 250ml polytetrafluoroethylene lining, add 20ml nitric acid, 40ml perchloric acid respectively Acid, 80ml hydrofluoric acid, place the crucible on a temperature-controlled electric heating plate and heat until the solution boils, and keep it for 2 hours or the solution evaporates to dryness, remove the crucible to cool, and transfer the acid-treated diamond powder to polytetrafluoroethylene In a plastic beaker, add high-purity water to rinse until the washing liquid is neutral, and the processed diamond powder is high-purity diamond powder after drying. The prepared high-purity diamond powder was measured by inductively coupled plasma emission spectrometry (ICP-AES) and ion chromatography, and its metal and non-metal impurity content is shown in attached...

Embodiment 2

[0019] Embodiment 2: take by weighing 10g of diamond micropowder (arbitrary between 0.1~50 microns of particle size peak value) that the diamond that artificial hydrostatic pressure synthesizes prepares, place in the crucible of 250ml polytetrafluoroethylene liner, add 20ml nitric acid, 30ml perchloric acid respectively Acid, 20ml hydrofluoric acid, place the crucible on a temperature-controlled electric heating plate and heat until the solution boils, and keep it for 6 hours or the solution evaporates to dryness, remove the crucible to cool, and transfer the acid-treated diamond powder to polytetrafluoroethylene In a plastic beaker, add high-purity water to rinse until the washing liquid is neutral, and the processed diamond powder is high-purity diamond powder after drying. The prepared high-purity diamond powder was measured by inductively coupled plasma emission spectrometry (ICP-AES) and ion chromatography, and its metal and non-metal impurity content is shown in attached ...

Embodiment 3

[0020] Embodiment 3: take by weighing 50g of diamond micropowder (arbitrary between particle size peak 0~50 microns) prepared by the diamond synthesized by detonation, place in the crucible of 250ml polytetrafluoroethylene lining, add 10ml nitric acid, 20ml perchloric acid respectively , 70ml of hydrofluoric acid, place the crucible on a temperature-controlled electric heating plate and heat until the solution boils, and keep it for 0.5 hours or the solution evaporates to dryness, remove the crucible to cool, and transfer the acid-treated diamond powder to Teflon plastic In the beaker, add high-purity water to rinse until the washing liquid is neutral, and the treated diamond powder will be high-purity diamond powder after drying. The prepared high-purity diamond powder was measured by inductively coupled plasma emission spectrometry (ICP-AES) and ion chromatography, and its metal and non-metal impurity content is shown in attached table 1.

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Abstract

A high-purity superfine diamond powder used for grinding and polishing the monocrystal wafer, IC board, or hard disc is prepared from the superfine diamond powder prepared by static pressure synthesis or explosion through wet-type chemical treating by nitric acid, perchloric acid, and hydrofluoric acid, washing with purified water, and drying.

Description

technical field [0001] The invention relates to a diamond micropowder with high chemical purity and a purification method thereof. technical background [0002] As the hardest substance known, diamond has an extremely wide range of irreplaceable applications in cutting, grinding, lapping, polishing and other fields. Micron and submicron diamond powders are mainly used to manufacture diamond cutting and grinding tools and related products. With the development of modern advanced electronic manufacturing technology, it is required to maintain high purity in the processing of electronic products such as single crystal silicon wafers, integrated circuit boards, computer hard disks, and avoid the introduction of trace impurities that may cause slight changes in the electrical properties of the products. Therefore, the grinding and polishing products for the manufacture of high-purity products require the ability to manufacture high-purity diamond micropowder as raw materials. A...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B31/06
Inventor 庞海岩汪静
Owner HENAN UNION ABRASIVES
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