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High-curren density heterogeneous beam electron source

A technology of high current density and beam electrons, applied in the field of electric vacuum, can solve the problems of increasing the volume and weight of devices

Inactive Publication Date: 2011-09-07
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For this reason, a strong permanent magnetic field must be used, which will greatly increase the volume and weight of the device

Method used

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  • High-curren density heterogeneous beam electron source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Embodiment 1 is used to provide the structure of the high current density special-shaped beam electron source, including the Mo sleeve, the heater matched with the molybdenum sleeve, the scandium oxide doped impregnated cathode assembled with the molybdenum sleeve, and the refractory metal tungsten Solid overlay. The cathode and the molybdenum sleeve are welded together by laser welding, and a heater is embedded under the sleeve to heat the cathode. EDM is used to process a rectangular area with an angle of 60 degrees between the side wall of the hole and the surface on the tungsten covering layer with a thickness of 50 microns. The lengths of the two sides are 200 microns and 800 microns respectively. , the average current density in the emission area reaches 55A / cm 2 , the maximum emission of the edge is 85A / cm 2 , and work stably for 120 hours under this condition. (see structure image 3 , rectangular beam shape and current distribution see Figure 5 and Figu...

Embodiment 2

[0028] Embodiment 2 is used to provide the structure of the high current density special-shaped beam electron source, including the Mo sleeve, the heater matched with the molybdenum sleeve, the scandium oxide doped pressed cathode assembled with the molybdenum sleeve, and the solid covering of noble metal niobium layer. The cathode and the molybdenum sleeve are welded together by laser welding, and a heater is embedded under the sleeve to heat the cathode. Laser micromachining technology is used to process a rectangular area with an angle of 80 degrees between the side wall of the hole and the surface on the niobium covering layer with a thickness of 100 microns. The lengths of the two sides are 100 microns and 400 microns respectively. When working, the average current density in the emission area reaches 50A / cm 2 , the maximum emission of the edge is 85A / cm 2 , and work stably for 200 hours under this condition.

Embodiment 3

[0029] Embodiment 3 is used to provide the structure of the high current density special-shaped beam electron source, including the Mo sleeve, the heater matched with the molybdenum sleeve, the scandium oxide doped impregnated cathode assembled with the molybdenum sleeve, and the entity of the tungsten-molybdenum alloy overlay. The cathode and the molybdenum sleeve are welded together by laser welding, and a heater is embedded under the sleeve to heat the cathode. EDM is used to process a rectangular area on the tungsten-molybdenum alloy covering layer with a thickness of 10 microns. The side wall of the hole is perpendicular to the surface. , the average current density in the emission area reaches 55A / cm 2 , the edge maximum emission is 90A / cm 2 , and work stably for 200 hours under this condition.

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Abstract

This is an electron source of high current density and hetero-stream. The traditional method for hetero-stream is by using of magnetic focusing on round stream, which needs strong permanent magnetic field, so leads to bigger size and weight of the instrument. This invention makes it available to get hetero-stream directly from cathode without or only little compressing. The source is composed by a diffuse cathode of high current density with metal Sc and a shaping device for hetero-stream. The two parts are fabricated in a molybdenum sleeve and proper heater. The size of the source is within dozens of square micrometers to several square centimeters. The current density is over 50A / cm<2>.

Description

technical field [0001] The invention relates to a high-current-density special-shaped beam electron source, which belongs to the field of electric vacuum, and in particular to a method for manufacturing cathodes required by certain millimeter-wave and submillimeter-wave band microwave vacuum electronic devices. Background technique [0002] With the development of microwave vacuum electronic devices in the millimeter wave and submillimeter wave bands, there is an urgent need for an electron source that can provide high current density shaped beams. The so-called shaped beam refers to an electron beam that is different from a conventional circular beam, such as a rectangular beam or a ring beam. This shape of the electron beam facilitates the interaction of the emitted electrons with high-frequency circuits, thereby increasing the efficiency of the device. At present, the commonly used method to obtain shaped beams is to use magnetic focusing to convert circular beams into e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J1/20H01J19/14
Inventor 王金淑王亦曼李莉莉王燕春刘伟周美玲左铁镛
Owner BEIJING UNIV OF TECH
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