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Reflection preventing film

An anti-reflection and thin-film technology, used in identification devices, instruments, synthetic resin layered products, etc., can solve problems such as cost reduction and film loss, and achieve excellent scratch resistance, low cost, and simple layer structure. Effect

Active Publication Date: 2008-01-16
LINTEC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the case of producing such a functional film, there are two methods including (1) forming a near-infrared ray absorbing layer on the inner surface of the antireflection film and (2) forming an antireflection layer on the inner surface of the near-infrared ray absorbing film, but in either case The loss of the film will occur under both, so the effect of cost reduction is reduced

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0095] (1) Preparation of liquid A (coating liquid for forming a hard coat layer)

[0096] 2 parts by weight of a photopolymerization initiator is added to 100 parts by weight of a multifunctional acrylate mixture [manufactured by Arakawa Chemical Co., Ltd., trade name "Bimset 577CB", solid content concentration: 100%] as an active energy ray-curable compound. [Chiba Speciarutei Chemicals Co., trade name "Irugakyua 907"], then, mix 300 parts by weight of a near-infrared absorber [manufactured by Sumitomo Metal Mining Co., Ltd., trade name "YMF-01", cesium-containing tungsten oxide (with respect to tungsten, containing 33mol% cesium) content 10% by weight suspension, total solid content concentration 14% by weight], dilute with methyl isobutyl ketone (MIBK), so that the total solid content concentration is 30% by weight, Liquid A (coating liquid for forming a hard coat layer) was prepared.

[0097] (2) Preparation of liquid B (coating liquid for forming a low refractive index)...

Embodiment 2

[0105]In Example 1, it carried out similarly to Example 1 except having changed the preparation of A liquid (coating liquid for hard-coat layer formation) as follows.

[0106]

[0107] In 100 parts by weight of a multifunctional acrylate mixture [manufactured by Arakawa Chemical Co., Ltd., trade name "Bim Setto 577CB", solid content concentration 100%], add 2 parts by weight of a photopolymerization initiator [Chiba Specialty Chemical Co., Ltd. system, trade name "イルガキキュア907"], then, mixing 1.3 parts by weight of a near-infrared absorber [manufactured by Nippon Shokubai, trade name "イルガックスカラ-IR-12", phthalocyanines, solid content concentration 100 % (powder)], 0.75 parts by weight of near-infrared absorber [manufactured by Nippon Shokubai, trade name "イクックスカラ-IR-14", phthalocyanines, solid content concentration 100% (powder)], 0.65 weight Parts of near-infrared absorber [manufactured by (strain) Nippon Shokubai, trade name "イクックスカラ-IR-906B", phthalocyanines, solid content co...

Embodiment 3

[0110] In Example 1, it carried out similarly to Example 1 except having changed the preparation of A liquid (coating liquid for hard-coat layer formation) as follows.

[0111]

[0112] In 100 parts by weight of a multifunctional acrylate mixture [manufactured by Arakawa Chemical Co., Ltd., trade name "Bim Setto 577CB", solid content concentration 100%], add 2 parts by weight of a photopolymerization initiator [Chiba Specialty Chemical Co., Ltd. manufactured, trade name "イルガキュア907"], and then mixed with 300 parts by weight of a near-infrared absorber [manufactured by Sumitomo Metal Mining Co., Ltd., trade name "YMF-01", cesium-containing tungsten oxide (with respect to tungsten, containing 33 mol% cesium) content 10% by weight suspension, total solid content concentration 14% by weight], and add 5 parts by weight of silicon dioxide particles as an antiglare imparting agent [manufactured by Tosoh Sirika Co., Ltd., trade name "Nipposhi [E-200", average particle diameter 3 μm],...

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Abstract

On one surface of a base material film, (A) a hard coat layer, which includes a cured resin cured by active energy beam irradiation, and a near infrared ray absorbent, and has a thickness of 2-20[mu]m, and (B) a low refraction index layer, which includes a cured resin cured by active energy beam irradiation, and has a refraction index of 1.43 or less, and a thickness of 50-200nm, are successively stacked. The reflection preventing film has a transmittance of 30% or less at least over the entire area having a wavelength of 850-1000nm. The film is provided with a near infrared ray absorbing characteristic and a reflection preventing characteristic, is excellent in abrasion resistance, suitably used especially for PDP, has a simple layer constitution and can be manufactured by wet-process at low cost.

Description

technical field [0001] The present invention relates to an anti-reflection film, more specifically, to an anti-reflection film having near-infrared absorption and anti-reflection properties, excellent scratch resistance, simple layer structure, and low cost, and is especially suitable for use as a plasma display. Background technique [0002] In image display devices such as plasma displays (PDPs), cathode ray tubes (CRTs), and liquid crystal displays (LCDs), light is irradiated from the outside to the screen, and the light is reflected, making it difficult to view the displayed image. With the increase in size of displays, solving the above-mentioned problems has become an increasingly important issue. [0003] In order to solve such problems, various displays have heretofore been subjected to various anti-reflection treatments and anti-glare treatments. As one of these methods, anti-reflection films are used on various displays. [0004] The anti-reflection film currentl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11G02B5/22B32B27/18G09F9/00
CPCB32B27/00G02B1/111
Inventor 所司悟小泉伸
Owner LINTEC CORP
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