High efficiency light emitting diode with surface mini column array structure using diffraction effect
A technology of light-emitting diodes and micro-pillar arrays, which is applied in the manufacture of semiconductor devices, electrical components, and semiconductor/solid-state devices, etc., to achieve the effect of high utilization of light-emitting area, improved utilization of surface light-emitting area, and simple production.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0028] The present invention will be further described below in conjunction with the accompanying drawings.
[0029] 1. Referring to FIG. 1, a GaN buffer layer is first deposited on a sapphire substrate, and then an LED epitaxial wafer is grown thereon.
[0030] 2. The micro-pillar array is etched on the P-type GaN layer by using the mask method, photolithography and dry etching technology.
[0031] 3. Prepare electrodes on N-type GaN, and prepare N-type pads on the electrodes; prepare electrodes on P-type GaN mesa, and prepare P-type pads on the electrodes. The electrode to be laid can be a transparent electrode, which is laid on the entire GaN layer; a common metal electrode with a simple structure can also be used. Ordinary metal material electrodes with complex pattern shapes can also be used.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com