High efficiency light emitting diode with surface mini column array structure using diffraction effect
A technology of light-emitting diodes and micro-pillar arrays, which is applied in the manufacture of semiconductor devices, electrical components, and semiconductor/solid-state devices, etc., to achieve the effect of high utilization of light-emitting area, improved utilization of surface light-emitting area, and simple production.
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[0028] The present invention will be further described below in conjunction with the accompanying drawings.
[0029] 1. Referring to FIG. 1, a GaN buffer layer is first deposited on a sapphire substrate, and then an LED epitaxial wafer is grown thereon.
[0030] 2. The micro-pillar array is etched on the P-type GaN layer by using the mask method, photolithography and dry etching technology.
[0031] 3. Prepare electrodes on N-type GaN, and prepare N-type pads on the electrodes; prepare electrodes on P-type GaN mesa, and prepare P-type pads on the electrodes. The electrode to be laid can be a transparent electrode, which is laid on the entire GaN layer; a common metal electrode with a simple structure can also be used. Ordinary metal material electrodes with complex pattern shapes can also be used.
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