Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device
A technology of photosensitive composition and photosensitive resin layer, applied in the direction of photo-engraving process, optics, opto-mechanical equipment, etc. on the pattern surface, can solve the problems of uneven image, unable to maintain uniformity, etc., and achieve high deformation recovery. , Eliminate display unevenness, the effect of high-quality image display
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[0146] Hereinafter, the present invention will be described more specifically using examples, but the present invention is not limited to the following examples unless the gist thereof is exceeded. In addition, unless otherwise specified, "%" and "part" are based on mass.
[0147] Synthesis of the resin (A) represented by the aforementioned compound structure P-1 is shown in Synthesis Example 1 below.
Synthetic example 1
[0149] 8.57 parts of 1-methoxy-2-propanol (manufactured by Daicel Chemical Industry Co., Ltd.) was added to the reaction vessel in advance, and the temperature was raised to 90°C. 6.27 parts of isopropyl methacrylate as a monomer of the group X, 5.15 parts of methacrylic acid as a monomer of the group Y having an acidic group on the side chain, an azo polymerization initiator (manufactured by Wako Pure Pharmaceutical Co., Ltd. A mixed solution consisting of 1 part of V-601) and 8.57 parts of 1-methoxy-2-propanol was dropped into a reaction vessel at 90°C over 2 hours under a nitrogen atmosphere. After dripping, it was made to react for 4 hours, and the acrylic resin solution was obtained.
[0150] Then, in the aforementioned acrylic resin solution, after adding 0.025 parts of hydroquinone monomethyl ether and 0.084 parts of tetraethylammonium bromide, it was added dropwise over 2 hours as the group Z having an ethylenically unsaturated group on the side chain. The monomer gly...
Synthetic example 2
[0154] Synthesis Example 2 of the resin represented by the aforementioned compound structure P-2 was performed as follows.
[0155] For the resin represented by the aforementioned compound structure P-2, the synthetic monomers are changed to tert-butyl methacrylate, methacrylic acid and glycidyl methacrylate and the addition amount is changed so that the aforementioned compound structure P- In 2, x: y: z is 40mol%: 25mol%: 35mol%. In addition, the same method as Synthesis Example 1 is used to synthesize to obtain the resin solution represented by the aforementioned compound structure P-2 having an unsaturated group .
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