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Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device

A technology of photosensitive composition and photosensitive resin layer, applied in the direction of photo-engraving process, optics, opto-mechanical equipment, etc. on the pattern surface, can solve the problems of uneven image, unable to maintain uniformity, etc., and achieve high deformation recovery. , Eliminate display unevenness, the effect of high-quality image display

Active Publication Date: 2008-01-30
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the display of high-quality images, it is required that the uniformity cannot be maintained and the image unevenness does not occur due to the above-mentioned reasons, such as the thickness of the liquid crystal layer becomes smaller than the design value, etc.

Method used

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  • Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device
  • Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device
  • Photosensitive composition, photosensitive resin transfer film, manufacturing method of photo spacer, substrate for liquid crystal display device, and liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0146] Hereinafter, the present invention will be described more specifically using examples, but the present invention is not limited to the following examples unless the gist thereof is exceeded. In addition, unless otherwise specified, "%" and "part" are based on mass.

[0147] Synthesis of the resin (A) represented by the aforementioned compound structure P-1 is shown in Synthesis Example 1 below.

Synthetic example 1

[0149] 8.57 parts of 1-methoxy-2-propanol (manufactured by Daicel Chemical Industry Co., Ltd.) was added to the reaction vessel in advance, and the temperature was raised to 90°C. 6.27 parts of isopropyl methacrylate as a monomer of the group X, 5.15 parts of methacrylic acid as a monomer of the group Y having an acidic group on the side chain, an azo polymerization initiator (manufactured by Wako Pure Pharmaceutical Co., Ltd. A mixed solution consisting of 1 part of V-601) and 8.57 parts of 1-methoxy-2-propanol was dropped into a reaction vessel at 90°C over 2 hours under a nitrogen atmosphere. After dripping, it was made to react for 4 hours, and the acrylic resin solution was obtained.

[0150] Then, in the aforementioned acrylic resin solution, after adding 0.025 parts of hydroquinone monomethyl ether and 0.084 parts of tetraethylammonium bromide, it was added dropwise over 2 hours as the group Z having an ethylenically unsaturated group on the side chain. The monomer gly...

Synthetic example 2

[0154] Synthesis Example 2 of the resin represented by the aforementioned compound structure P-2 was performed as follows.

[0155] For the resin represented by the aforementioned compound structure P-2, the synthetic monomers are changed to tert-butyl methacrylate, methacrylic acid and glycidyl methacrylate and the addition amount is changed so that the aforementioned compound structure P- In 2, x: y: z is 40mol%: 25mol%: 35mol%. In addition, the same method as Synthesis Example 1 is used to synthesize to obtain the resin solution represented by the aforementioned compound structure P-2 having an unsaturated group .

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Abstract

The present invention provides a photosensitive composition, a photosensitive resin transfer film comprising the photosensitive composition, a method for making the photosensitive partition column using the material, a liquid crystal display device substrate comprising the photosensitive partition column, and a liquid crystal display device comprising the liquid crystal display device, the photosensitive composition at least includes the resin (A), the polymerized compound (B), and the photopolymerization initiating agent (C), the resin (A) includes the group which comprises branched chain and / or alicyclic structure at the side chain, the group which comprises acidic groups at the side chain, and the group which comprises the ethylenically unsaturated groups at the side chain. According to the invention a photosensitive composition which has a high deformation recovery character and can eliminate the display nonuniformity in the liquid crystal display device and the photosensitive resin transfer film, the method for making the photosensitive partition column using the material, the liquid crystal display device substrate which prevents the display nonuniformity and can do high-image quality display, and the liquid crystal display device are provided.

Description

technical field [0001] The present invention relates to a method for producing a photosensitive composition, a photosensitive resin transfer film, and a photo spacer, and a substrate for a liquid crystal display device having a photospacer produced by the method, and a liquid crystal display device, the photosensitive composition is suitable for making a spacer constituting a display device, and the display device is prone to display unevenness due to variations in cell thickness of a liquid crystal cell. Background technique [0002] Currently, liquid crystal display devices are widely used as display devices for displaying high-quality images. In a liquid crystal display device, a liquid crystal layer capable of displaying images with a predetermined orientation is generally disposed between a pair of substrates, and maintaining the substrate gap, that is, the thickness of the liquid crystal layer uniformly is one of the factors that determine image quality. Therefore, a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/028G03F7/00G02F1/1339
CPCG02F1/13394G03F7/0007G03F7/0047G03F7/027G03F7/031G03F7/033G03F7/0388
Inventor 吉成伸一后藤英范藤牧一广吉村耕作望月乔平
Owner FUJIFILM CORP
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