Method for cutting crisp material substrate
A technology for brittle material substrates and cutting methods, applied in glass cutting devices, welding/welding/cutting items, stone processing equipment, etc., can solve problems affecting product yield and damage to glass substrates, so as to improve product yield and guarantee The effect of cut quality
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2008-02-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a cutting method for a brittle material substrate, in particular to a cutting method for laser cutting a brittle material substrate. Background technique
[0002] With the continuous development of technology, liquid crystal display devices (TFT-LCD) have been widely used in the consumer field due to their own characteristics. A liquid crystal display device is generally composed of two glass substrates, liquid crystal contained in the two glass substrates and a number of circuits. The liquid crystal can change the arrangement mode under the influence of the electric field to complete the display operation. In order to form liquid crystal display panels of different sizes, it is generally necessary to cut larger liquid crystal display panels to meet different requirements.
[0003] In the process of cutting glass substrates by laser, most of the cutter wheels, diamond knives or gas lasers are used to generate pre-cut lines on...
Examples
Embodiment Construction
[0015] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0016] Please refer to FIG. 1, the method for cutting a brittle material substrate provided by an embodiment of the present invention includes the following steps:
[0017] (1) A brittle material substrate 20 is provided, and the brittle material substrate 20 may be a glass substrate, a ceramic substrate, a quartz substrate, a silicon wafer (Silicon Wafer) and the like.
[0018] (2) Using the first laser beam 240 generated by the solid-state laser 210 to form a pre-cut line (Pre-crack) 23 on the surface of the brittle material substrate 20 . The specific steps are as follows:
[0019] The brittle material substrate 20 to be processed is placed on the carrier platform (not shown); the first laser beam 240 generated by the solid-state laser 210 is guided to the first focusing lens group 230 after passing through the first reflector 220, the first The focusing...