Reaction method and apparatus and method and apparatus for manufacturing chemical substance using the same

A technology of chemical substances and reaction devices, which is applied in the direction of chemical methods, chemical/physical processes, separation methods, etc. that make liquids react with liquids, and can solve problems such as difficult movement, uneven mixing areas and reaction areas, and unstable supply of liquids , to achieve the effect of stable flow, long channel length and stable reaction

Inactive Publication Date: 2008-03-26
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This is because, in continuous flow methods, air bubbles lead to unsteady flow for continuous processing, creating inhomogeneous mixing and reaction zones
Also, the balance of the reaction beco

Method used

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  • Reaction method and apparatus and method and apparatus for manufacturing chemical substance using the same
  • Reaction method and apparatus and method and apparatus for manufacturing chemical substance using the same
  • Reaction method and apparatus and method and apparatus for manufacturing chemical substance using the same

Examples

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Embodiment approach 1

[0140] The reaction method and apparatus of the present invention will be discussed in Embodiment 1 of the present invention.

[0141] Fig. 1 is an overall configuration diagram showing an example of the reaction device and the continuous flow method of the present invention. The reaction device 10 of the present invention can be applied to any reaction system as long as the gas is continuously generated by the liquid phase reaction method (liquid-liquid reaction) as the reaction progresses. This embodiment will discuss an example of continuous production of metal fine particles contained in a magnetic layer of a magnetic recording medium. Furthermore, in Embodiment 1, two solutions, solution L1 and solution L2, were reacted to prepare metal fine particles. The solution is obtained by dissolving a solute for producing metal fine particles into a solvent.

[0142] As shown in FIG. 1 , the reaction device 10 is mainly composed of a sealed mixing device 12 for mixing two or mor...

Embodiment 1

[0213] The following are examples of Embodiment 1 of the present invention. Embodiment 1 is not limited to this example.

[0214] In high-purity nitrogen, proceed as follows:

[0215] By dissolving 0.50 g of NaBH4 (Wako Pure Chemical Industries, Ltd.) in 16 ml H 2 O (deoxygenated to a dissolved oxygen of 0.1mg / l or less) and prepared reducing agent solution, added by adding 10.8g of aerosol OT (Wako Pure Chemical Industries, Ltd.), 80ml of decane (Wako Pure Chemical Industries, Ltd.) and 2 ml of oleylamine (TokyoKasei Kogyo Co., Ltd.) were mixed and mixed to prepare a reserved micellar solution of the first solution L1.

[0216] To pass 0.6g triammonium iron (III) oxalate (Fe(NH4) 3 (C 2 o 4 ) 3 ) (Wako PureChemical Industries, Ltd.) and 0.50 g of potassium chloroplatinate (K 2 PtCl 4 ) (Wako PureChemical Industries, Ltd.) dissolved in 8lm of H 2 O (deoxygenated to a dissolved oxygen of 0.1mg / l or less) and the metal salt solution prepared by adding 7.0g of aerosol OT...

Embodiment approach 2

[0226] Embodiment 2 describes a method and an apparatus for preparing a chemical substance according to the present invention using the reaction method and apparatus of Embodiment 1 of the present invention. The following is an example in which the prepared chemical substance is a metal fine particle contained in a magnetic layer of a magnetic recording medium. Using solution L1, solution L2, solution L3, and solution L4, metal fine particles were prepared in continuous flow.

[0227] FIG. 18 is a diagram showing an overall structure of a preparation unit 200 for chemical substances according to the present invention. The first mixing device 212 for mixing the solution L1 and the solution L2 and the degassing device 214 for removing the gas generated by the reaction are similar to those of Embodiment 1. In Embodiment 2, the second mixing device 213 for adding and mixing the solution L3 is arranged after the degassing device 214 .

[0228] As shown in FIG. 18 , the preparatio...

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Abstract

The present invention provides a reaction method for a reaction system generating gas by a reaction, comprising the steps of: providing a sealed mixing section for mixing a plurality of liquids to start a reaction and a degassing section having a gas-liquid interface for removing, from a reaction liquid, gas bubbles generated from a mixed reaction liquid, separately; and feeding the reaction liquid mixed in the mixing section to the degassing section, without being interfered by gas bubbles even in a reaction system where gas is generated by a reaction, so that it is possible to stabilize a reaction at the start of the reaction and in the progress of the reaction and stably feed liquid to a subsequent process.

Description

technical field [0001] The present invention relates to a reaction method and device and a method and device for preparing chemical substances using the reaction method and device, in particular, to a reaction method and device in a reaction system in which bubbles are generated by liquid-liquid reaction , and a method and a device for preparing chemical substances using the reaction method and device. Background technique [0002] When dealing with a reaction system in which bubbles are generated by a liquid-liquid reaction, it is necessary to actively perform degassing in both the batch method and the continuous flow method in order to stabilize the reaction at the beginning of the reaction and during the progress of the reaction. In a batch process, when mixing is performed in a system that traps air bubbles using an agitator, less shear force may be applied to the continuous phase due to the volume change of the air bubbles. Therefore, stirring efficiency is lowered, an...

Claims

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Application Information

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IPC IPC(8): B01J14/00B01F3/08B01D19/00
CPCH01F1/0063
Inventor 白石文子长泽英治市川靖典杉山诚二胁幸吉
Owner FUJIFILM CORP
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