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Co-Fe-Zr based alloy sputtering target material and process for production thereof

A co-fe-zr, sputtering target technology, applied in sputtering plating, metal material coating process, ion implantation plating, etc., can solve the problems of leakage magnetic flux and high target permeability

Inactive Publication Date: 2008-04-16
HITACHI METALS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0013] The Co-Fe-Zr alloy sputtering target is generally manufactured by melting and casting, but there is a problem that the target has a high magnetic permeability and cannot obtain sufficient leakage magnetic flux.

Method used

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  • Co-Fe-Zr based alloy sputtering target material and process for production thereof
  • Co-Fe-Zr based alloy sputtering target material and process for production thereof
  • Co-Fe-Zr based alloy sputtering target material and process for production thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0060] Hereinafter, the present invention will be described in more detail with reference to examples.

[0061] In the following examples, the alloy compositions are all set to Co-27.6Fe-4Zr-4Nb (atomic %). After preparing various powders shown in Table 1 by a gas atomization method using Ar gas, the atomized powders were classified with a 60-mesh sieve. Various spray powders were weighed and mixed in the combinations shown in Table 1 so that the composition of the mixed powder was Co-27.6Fe-4Zr-4Nb (atomic %), and then filled into a mild steel container and sealed for degassing. Then, under the conditions of pressure 122MPa, temperature 950°C, and holding time 1 hour, sintered body was made by hot isostatic pressing, and then a Co-Fe-Zr alloy sputtering target with a diameter of 190mm and a thickness of 12mm was made by machining material.

[0062] Moreover, after the ingot of the same composition was produced by melt casting, the Co-Fe-Zr system alloy sputtering target mat...

Embodiment 2

[0078] In the following examples, the alloy compositions are all set to Co-27Fe-5Zr-5Ta (atomic %). A Co—Fe—Zr-based alloy sputtering target with a diameter of 190 mm and a thickness of 15 mm was prepared in the same manner as in Example 1 using various powders shown in Table 4. In addition, a Co—Fe—Zr-based alloy sputtering target with a diameter of 190 mm and a thickness of 15 mm was also produced by machining after producing an ingot of the same composition by melting and casting.

[0079] Table 4

[0080] Sample No.

[0081] As in Example 1, a test piece was taken from the end material of the target of the above-mentioned sample 11, the microstructure was observed with a scanning electron microscope, and the phase was identified by X-ray diffraction measurement. In addition, the above-mentioned microstructure observation and X-ray diffraction measurement used the same method and the same apparatus as in Example 1.

[0082] FIG. 5 shows a scanning electron micro...

Embodiment 3

[0090] In the following examples, the alloy compositions are all set to Co-36.8Fe-5Zr-3Ta (atomic %). A Co—Fe—Zr-based alloy sputtering target with a diameter of 190 mm and a thickness of 15 mm was produced in the same manner as in Example 1 using various powders shown in Table 7. In addition, a Co—Fe—Zr-based alloy sputtering target with a diameter of 190 mm and a thickness of 15 mm was also produced by machining after producing an ingot of the same composition by melting and casting.

[0091] Table 7

[0092] Sample No.

[0093] As in Example 1, a test piece was taken from the end material of the target of the above-mentioned sample 21, the microstructure was observed with a scanning electron microscope, and the phase was identified by X-ray diffraction measurement. In addition, the above-mentioned microstructure observation and X-ray diffraction measurement used the same method and the same apparatus as in Example 1.

[0094] FIG. 7 shows a scanning electron mic...

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Abstract

The present invention relates to a Co-Fe-Zr based alloy target material for forming a soft magnetic film of the Co-Fe-Zr based alloy used in a perpendicular magnetic recording medium, and provides a Co-Fe-Zr based alloy target material having a low magnetic permeability and good sputtering characteristics and a process for producing this target material. A Co-Fe-Zr based alloy sputtering target material represented by the compositional formula based on the atomic ratio: (Cox-Fe100-X)100-(Y+Z)-ZrY-MZ (20<=X<=70, 2<=Y<=15 and 2<=Z<=10) in which the element(s) M is one or more elements selected from the group consisting of Ti, V, Nb, Ta, Cr, Mo, W, Si, Al and Mg, wherein a phase composed of HCP-Co and an alloy phase composed mainly of Fe are finely dispersed in the microstructure of the target material.

Description

technical field [0001] The invention relates to a Co-Fe-Zr alloy sputtering target material for forming a soft magnetic film and a manufacturing method thereof. Background technique [0002] In recent years, magnetic recording technology has made remarkable progress, and due to the miniaturization and increase in capacity of drives, research on the densification of magnetic recording media has been vigorously developed. However, when the magnetic recording medium of the in-plane magnetic recording method widely used in the world is used to simultaneously realize the miniaturization and increase of the capacity of the drive, the field used for 1-bit recording becomes smaller, and the magnetic force will be caused after canceling with the surrounding magnetic regions. lost. Therefore, as a method for further increasing recording density, a perpendicular magnetic recording method has been developed and is currently in the stage of practical use. [0003] The so-called perpend...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/14B22F3/12
CPCB22F2998/10C23C14/3414C22C1/0433B22F9/082B22F3/15
Inventor 福冈淳高岛洋上野友典藤本光晴上野英
Owner HITACHI METALS LTD