Liquid crystal display device and manufacturing method thereof

Abstract

The invention relates to the method for producing the following liquid crystal display equipment. The liquid crystal display equipment comprises an array substrate, a relative substrate corresponding to the array substrate and a liquid crystal layer between the substrates. The method comprises the step to have orientation treatment to the orientation film formed at the surface contacting the liquid crystal of at least one of the substrates. When the energy intensity is set the lowest in the final radiation step, the orientation treatment is carried out through irradiating the energy with anisotropy to the orientation film in a plurality of steps, such as ion beam.

Description

[0001] This application is based on and claims priority from Japanese Patent Application No. 2006-316590 filed on November 24, 2006, the disclosure of which is incorporated herein by reference in its entirety. technical field [0002] The invention relates to a liquid crystal display device and a manufacturing method thereof. Background technique [0003] Liquid crystal display devices have gained popularity due to their thin profile and light weight, and their application fields have been expanded. For example, they are now used not only as display devices for information processing terminals but also as display devices for various types of industrial equipment, on-vehicle equipment such as car navigation systems, and as display devices for medical or broadcasting equipment. As their fields of application expand, liquid crystal display devices require higher display quality. [0004] A TN (Twisted Nematic) method of generating an electric field between a driving substrate ...

AI Technical Summary

Problems solved by technology

In this case, it is difficult to selectively sever the bond between atoms, so that the orientation adjustment force cannot be improved

[0014] On the other hand, in order to increase the orientation regulation force while maintaining a low particle radiation velocity, it is necessary to irradiate for a longer time period

However, this also creates the problem of increasing the amount of particle radiation

The first problem is that the extended exposure of irradiated particles to the substrate surface raises the temperature of the substrate surface, making it difficult to control the process

The second problem is that when an organic film formed by a printing method is used to form an alignment film, the molecules near the interface with the gas are pre-aligned due to the interface effect, and if this treatment is performed without increasing the radiation velocity of the particles, it cannot be moved. Except for such a layer, thereby the alignment adjustment force cannot be improved in the predetermined alignment direction

However, even if the ion beam irradiation method is performed after the rubbing treatment like Patent Reference 3, the waste generated during the rubbing treatment will have an effect after the ion beam irradiation

In addition, after the rubbing treatment, the waste from the alignment film generated during the rubbing treatment cannot be completely removed by washing

This waste can block the irradiated ion beam, causing misorientation, or the waste can remain in the liquid crystal cell, causing errors when vibration or heat is applied to the liquid crystal cell

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