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Layer sequence and method of manufacturing a layer sequence

A layer sequence, nickel layer technology, applied in the field of manufacturing layer sequence, can solve the problems of time-consuming and expensive, and achieve the effect of simplifying the manufacturing process, reducing the total cost and making the production simple

Inactive Publication Date: 2008-06-04
NXP BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, the under bump metallization (UBM) according to US 2005 / 0029677 A1 is complex and thus time consuming and expensive to manufacture

Method used

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  • Layer sequence and method of manufacturing a layer sequence
  • Layer sequence and method of manufacturing a layer sequence
  • Layer sequence and method of manufacturing a layer sequence

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Embodiment Construction

[0059] The illustrations in the figures are schematic. In different figures, similar or identical elements are provided with the same reference signs.

[0060] Hereinafter, referring to FIG. 1 , the layer sequence 100 will be described.

[0061] The layer sequence 100 comprises a semiconductor chip component 101 on which an interconnect metal layer 102 is applied. A passivation layer 103 is deposited and patterned on the interconnect metal layer 102 . Also, an aluminum layer 104 is deposited on the interconnection metal layer 102 and the passivation layer 103 . Further, a nickel / vanadium layer 105 is deposited on the aluminum layer 104 . Also, a copper layer 106 is deposited on the nickel / vanadium layer 105 . Then, lead-containing or lead-free solder balls 107 are applied on the copper layer 106 .

[0062] Referring to FIG. 1 , UBM (Under Bump Metallization) is used as an interconnection layer for preformed solder balls. A metallization stack is created from Al / NiV / Cu (l...

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PUM

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Abstract

A layer sequence (400), comprising an aluminum layer (300), a nickel layer (301), and a nickel layer protection layer (302; 701). The aluminum layer (300) is formable on a substrate (200), the nickel layer (301) is formed on the aluminum layer (300), and the nickel layer protection layer (302; 701) is formed on the nickel layer (301).

Description

technical field [0001] The invention relates to layer sequences. [0002] The invention also relates to the use of layer sequences as under bump metallisation. [0003] The invention also relates to a method for producing a layer sequence. [0004] For the semiconductor industry, the manufacture of integrated circuits includes different stages, namely making the wafer, making the integrated circuit and connecting the integrated circuit to the environment, for example by soldering the integrated circuit to a PCB (printed circuit board). Background technique [0005] US2005 / 0012211A1 discloses an under bump metallurgy structure between die or substrate and solder bump bonding, comprising an adhesive layer, a barrier layer and a wettable layer. [0006] US 2005 / 0029677A1 discloses an under bump metallurgy (UBM) layer comprising a first metal layer, a liner layer, a second metal layer and a third metal layer. And, a passivation layer is formed on the surface of the chip. [...

Claims

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Application Information

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IPC IPC(8): H01L23/485
CPCH01L2924/01015H01L2924/01032H01L2924/01023H01L2924/01082H01L2924/19043H01L2224/13022H01L2924/01047H01L24/13H01L2924/14H01L2924/13091H01L2924/01327H01L2924/19042H01L2924/01005H01L2924/01033H01L2924/01006H01L2924/01029H01L2924/00013H01L2924/10329H01L2924/01022H01L2924/10253H01L2924/19041H01L2224/131H01L24/11H01L2924/014H01L2924/01013H01L2224/05027H01L2224/05023H01L2224/05001H01L2224/05572H01L2224/05124H01L2224/05155H01L2224/05639H01L2224/05647H01L2224/05655H01L2224/05666Y10T428/1275Y10T428/12528Y10T428/12674H01L24/05H01L24/03H01L2224/0401H01L2224/13099H01L2924/00H01L2924/00014
Inventor 托马斯·郎格约尔格·西雷迈克尔·罗瑟特斯坦·克雷尔
Owner NXP BV
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