Unlock instant, AI-driven research and patent intelligence for your innovation.

Redistribution structure and production method thereof, redistribution convex point and production method thereof

A redistribution structure and redistribution technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of bump redistribution, complex bump structure, easy corrosion of metal, and many process steps. Achieve the effects of simple structure, improved stability and simple process

Active Publication Date: 2008-10-29
SEMICON MFG INT (SHANGHAI) CORP
View PDF1 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The problem solved by the present invention is that the structure of the bump redistribution bump in the prior art is complex, there are many process steps, and the metal used in the redistribution route is relatively easy to be corroded.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Redistribution structure and production method thereof, redistribution convex point and production method thereof
  • Redistribution structure and production method thereof, redistribution convex point and production method thereof
  • Redistribution structure and production method thereof, redistribution convex point and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] Aiming at the manufacturing method of the lead-tin alloy bump adopted in the present invention, a detailed description will be given below in conjunction with the accompanying drawings and embodiments.

[0021] The essence of the present invention is to provide a redistribution structure and a redistribution bump, which are used to redistribute the connection points set on the wafer, realize a reasonable layout of the bumps when forming bumps on the connection points, and avoid bumps. Short circuit between points.

[0022] First, the present invention provides a redistribution structure, comprising: a wafer with a first passivation layer on the surface; a first opening located in the first passivation layer and exposing the wafer surface; a redistribution metal layer located in the first passivation layer layer and fill the first opening; the second passivation layer covers the redistribution metal layer; the second opening is located in the second passivation layer and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A redistribution structure includes a wafer the surface of which is provided with a first passivation layer; a first cut arranged in the first passivation layer and exposes the surface of the wafer; a redistribution metal layer which is arranged on the first passivation layer and fills the first cut; a second passivation layer covering the redistribution metal layer; a second cut which is arranged in the second passivation layer and exposes the redistribution metal layer; the first cut and the second cut are distributed by offsetting. The invention also provides a forming method for the redistribution structure and a redistribution salient point comprising the redistribution structure as well as a forming method of the redistribution salient point. The structures of the redistribution structure and the redistribution salient point of the invention are simple; the technique steps for forming the redistribution structure and the redistribution salient point are less; the technique is simple.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a redistribution structure and a manufacturing method thereof, and a redistribution bump and a manufacturing method thereof. Background technique [0002] Wafer Level Chip Scale Package (WLCSP) is a CSP packaging technology that enables integrated circuits (ICs) to be mounted face down on a printed circuit board. The solder joints of the chip are soldered to the printed circuit board through independent solder balls. No fill material is required on the pad. The first advantage of this technology is that the inductance between the integrated circuit and the printed circuit board is very small, and the second advantage is that the package size and production cycle are reduced and the heat conduction performance is improved. [0003] With the gradual reduction of the size of integrated circuit chips and the continuous improvement of integration, the electronics industry has ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/482H01L23/485H01L21/60
CPCH01L24/11H01L2224/11H01L2924/14H01L2924/00H01L2924/00012
Inventor 王继明李润领靳永刚梅娜
Owner SEMICON MFG INT (SHANGHAI) CORP