Polysilicon film preparation with controllable crystal particle dimension and detection device
A polysilicon thin film and detection device technology, which is applied in the directions of polycrystalline material growth, crystal growth, single crystal growth, etc., can solve the problems of high cost and time-consuming, film destructiveness, etc.
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[0024] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.
[0025] see first figure 1 , figure 1 It is a schematic diagram of the preparation and detection device of the polysilicon thin film with controllable grain size of the present invention. It can be seen from the figure that the preparation and detection device of the polysilicon thin film with controllable grain size of the present invention consists of a laser source 1, a beam splitter 2, a beam shaping system 4, Polysilicon thin film substrate 5, optical focusing system 7, stimulated Raman spectrum receiving system 8, Raman data analysis and feedback system 9 and a mobile workbench, the positional relationship of each component is as follows: the polysilicon thin film substrate 5 set On the mobile workbench, the laser beam output by the laser source 1 is divided into the ...
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Abstract
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