Thermal batch reactor with removable susceptors

Abstract

An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz chamber body, an inject assembly coupled to one side of the quartz chamber body, and a substrate boat having removable susceptors. In one embodiment, the boat may be configured with a plurality of susceptors to control substrate heating during batch processing.

Description

technical field [0001] Embodiments of the invention generally relate to a batch processing chamber. More specifically, embodiments of the present invention relate to methods and apparatus for uniform heating of substrates and uniform delivery of gases in batch processing chambers. Background technique [0002] The term batch processing generally refers to the simultaneous processing of two or more substrates in one reactor. There are several advantages to batching substrates. Batch processing can increase the throughput of a substrate processing system by executing process recipe steps for a disproportionate amount of time compared to other process recipe steps of the substrate processing sequence. For longer menu steps, the use of batch processing effectively reduces the processing time per substrate. Another advantage of batch processing can be seen in some processing steps such as ALD (Atomic Layer Deposition) and CVD (Chemical Vapor Deposition) that use expensive prec...

AI Technical Summary

Problems solved by technology

However, single substrate processing chambers typically have lower throughput and higher processing costs per substrate than batch chambers

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