Ceramic high barrier film apparatus of continuous winding type magnetron sputtering manufacture
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- HARBIN UNIV OF COMMERCE
- Publication Date
- 2009-01-28
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1
Abstract
Description
(1) Technical field
[0001] The invention relates to ceramic coating technology, in particular to a ceramic coating device by magnetron sputtering method. (2) Background technology
[0002] At present, the equipment used for magnetron sputtering ceramic coating all over the world adopts a bell-type or vertical deposition device. The circular deposition chamber is stood on the support, and the upper and lower plates are also circular and smaller than the diameter of the bell. The disadvantage is that the bell jar type or vertical deposition device is limited by the flange sealing method and space utilization, so it cannot be made very large. If it is too large, it will be difficult to process and easy to deform. In addition, the larger the diameter, the smaller the proportion of practical space. The higher the cost of single-piece processing, the more difficult it is to seal the vacuum chamber. Every time a batch is produced, the vacuum is re-evacuated, and the preparation tim...