Ceramic high barrier film apparatus of continuous winding type magnetron sputtering manufacture

A magnetron sputtering and winding device technology, which is applied in sputtering coating, ion implantation coating, metal material coating process, etc., can solve the problems of non-continuous production, re-vacuumization, low production capacity, etc., and achieve Increased efficiency, increased vacuuming speed, and low cost

Inactive Publication Date: 2009-01-28
HARBIN UNIV OF COMMERCE
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  • Abstract
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Problems solved by technology

[0003] The purpose of the present invention is to provide a device that overcomes the shortcomings of the above-mentioned existing equipment, can be continuously produced, and can better solve the problems that the bell jar type or vertical deposition device cannot be continuously produced, the production c

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  • Ceramic high barrier film apparatus of continuous winding type magnetron sputtering manufacture

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Embodiment Construction

[0017] The present invention will be further described below in conjunction with accompanying drawing and specific embodiment:

[0018] combine figure 1 , this example includes:

[0019] 1. The unwinding vacuum chamber 1 and the winding vacuum chamber 8, at least one coating vacuum chamber, the vacuum connection box connecting the winding, unwinding vacuum chamber and the coating vacuum chamber, and the coating vacuum chamber has a cooling roller located in the vacuum coating box A vacuum pumping system consisting of at least three sets of cathodes, high and low pressure vacuum pumps and pipelines is arranged around the cooling roller. The cathode target and target core of the magnetron sputtering are set in each vacuum coating box, and the cathode passes through the cathode. The flange connection seat is installed on the wall of the vacuum coating box in the form of flange connection, and the connecting pipelines of gas, power supply and cooling water are placed outside the ...

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Abstract

The invention provides a ceramic high-resistance film device manufactured by a continuous coiling type magnetic-control sputtering method, which comprises a settling chamber, a unwinding device, a winding device, a radio frequency AC power source, and a butterfly valve, a mechanical pump, a lobe pump and a molecular pump which are arranged at the exterior of the settling chamber. In the middle of the settling chamber, a coating roller is installed, while at the lower part thereof, a rectangular silicon target is provided and at two ends thereof, end sockets are provided; at least one observation window is arranged on the settling chamber; and the lower part of the settling chamber is respectively connected with the mechanical pump, the lobe pump and the molecular pump via the butterfly valve and conduits. The ceramic high-barrier film device of the invention is characterized by continuous production, can better solve the problems of bell-typed or vertical-typed sedimentation device where the continuous production is unavailable, the production capacity is low and vacuum extraction needs to be conducted again for every time; and the utilization of the rectangular silicon target can fully utilize the space of the settling chamber and the large-scale industrialized production is convenient.

Description

(1) Technical field [0001] The invention relates to ceramic coating technology, in particular to a ceramic coating device by magnetron sputtering method. (2) Background technology [0002] At present, the equipment used for magnetron sputtering ceramic coating all over the world adopts a bell-type or vertical deposition device. The circular deposition chamber is stood on the support, and the upper and lower plates are also circular and smaller than the diameter of the bell. The disadvantage is that the bell jar type or vertical deposition device is limited by the flange sealing method and space utilization, so it cannot be made very large. If it is too large, it will be difficult to process and easy to deform. In addition, the larger the diameter, the smaller the proportion of practical space. The higher the cost of single-piece processing, the more difficult it is to seal the vacuum chamber. Every time a batch is produced, the vacuum is re-evacuated, and the preparation tim...

Claims

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Application Information

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IPC IPC(8): C23C14/56C23C14/35C23C14/08
Inventor 孙智慧林晶刘壮高德
Owner HARBIN UNIV OF COMMERCE
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